Catadioptric projection objective

ABSTRACT

A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D max , a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP 1 =D max /(Y′·NA 2 ) and wherein the condition COMP 1 &lt;10 holds.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. Application of U.S.application Ser. No. 11/653,366, filed Jan. 16, 2007, which is acontinuation-in-part of International Application PCT/EP2005/007431,filed Jul. 8, 2005, which claims benefit of U.S. ProvisionalApplications 60/587,504, filed Jul. 14, 2004, 60/591,775, filed Jul. 27,2004, 60/612,823, filed Sep. 24, 2004, 60/617,674, filed Oct. 13, 2004,60/654,950, filed Feb. 23, 2005, and is further a continuation-in-partof U.S. application Ser. No. 11/035,103, filed Jan. 14, 2005, now U.S.Pat. No. 7,385,756. U.S. application Ser. No. 11/035,103 claims benefitof U.S. Provisional Applications 60/536,248, 60/587,504, 60/612,823, and60/617,674. The disclosures of each of these related applications arehereby incorporated by reference into the present continuationapplication.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates to a catadioptric projection objective for imaginga pattern arranged in an object surface onto an image surface.

2. Description of the Related Art

Projection objectives of that type are employed on projection exposuresystems, in particular wafer scanners or wafer steppers, used forfabricating semiconductor devices and other types of microdevices andserve to project patterns on photomasks or reticles, hereinafterreferred to generically as “masks” or “reticles,” onto an object havinga photosensitive coating with ultrahigh resolution on a reduced scale.

In order create even finer structures, it is sought to both increase theimage-end numerical aperture (NA) of the projection objective to beinvolved and employ shorter wavelengths, preferably ultraviolet lightwith wavelengths less than about 260 nm.

However, there are very few materials, in particular, synthetic quartzglass and crystalline fluorides, that are sufficiently transparent inthat wavelength region available for fabricating the optical elementsrequired. Since the Abbé numbers of those materials that are availablelie rather close to one another, it is difficult to provide purelyrefractive systems that are sufficiently well color-corrected (correctedfor chromatic aberrations).

In lithography, a flat (planar) image is essential to expose planarsubstrates, such as semiconductor wafers. However, generally the imagesurface of an optical system is curved, and the degree of curvature isdetermined by the Petzval sum. The correction of the Petzval sum isbecoming more important in view of the increasing demands to projectlarge object fields on planar surfaces with increased resolution.

One approach for obtaining a flat image surface and goodcolor-correction is the use of catadioptric systems, which combine bothrefracting elements, such as lenses, and reflecting elements, such asmirror, preferably including at least one concave mirror. While thecontributions of positive-powered and negative-powered lenses in anoptical system to overall power, surface curvature and chromaticaberrations are opposite to each other, a concave mirror has positivepower like a positive-powered lens, but the opposite effect on surfacecurvature without contributing to chromatic aberrations.

Further, the high prices of the materials involved and limitedavailability of crystalline calcium fluoride in sizes large enough forfabricating large lenses represent problems. Measures that will allowreducing the number and sizes of lenses and simultaneously contribute tomaintaining, or even improving, imaging fidelity are thus desired.

Catadioptric projection objectives having at least two concave mirrorshave been proposed to provide systems with good color correction andmoderate lens mass requirements. The U.S. Pat. No. 6,600,608 B1discloses a catadioptric projection objective having a first, purelyrefractive objective part for imaging a pattern arranged in the objectplane of the projection objective into a first intermediate image, asecond objective part for imaging the first intermediate image into asecond intermediate image and a third objective part for imaging thesecond intermediate image directly, that is without a furtherintermediate image, onto the image plane. The second objective part is acatadioptric objective part having a first concave mirror with a centralbore and a second concave mirror with a central bore, the concavemirrors having the mirror faces facing each other and defining anintermirror space or catadioptric cavity in between. The firstintermediate image is formed within the central bore of the concavemirror next to the object plane, whereas the second intermediate imageis formed within the central bore of the concave mirror next to theobject plane. The objective has axial symmetry and provides good colorcorrection axially and laterally. However, since the reflecting surfacesof the concave mirrors are interrupted at the bores, the pupil of thesystem is obscured.

The Patent EP 1 069 448 B1 discloses another catadioptric projectionobjective having two concave mirrors facing each other. The concavemirrors are part of a first catadioptric objective part imaging theobject onto an intermediate image positioned adjacent to a concavemirror. This is the only intermediate image, which is imaged to theimage plane by a second, purely refractive objective part. The object aswell as the image of the catadioptric imaging system are positionedoutside the intermirror space defined by the mirrors facing each other.Similar systems having two concave mirrors, a common straight opticalaxis and one intermediate image formed by a catadioptric imaging systemand positioned besides one of the concave mirrors are disclosed inJapanese patent application JP 2002208551 A and US patent application US2002/00241 A1.

European patent application EP 1 336 887 (corresponding to US2004/0130806 A1) discloses catadioptric projection objectives having onecommon straight optical axis and, in that sequence, a first catadioptricobjective part for creating a first intermediate image, a secondcatadioptric objective part for creating a second intermediate imagefrom the first intermediate image, and a refractive third objective partforming the image from the second intermediate image. Each catadioptricsystem has two concave mirrors facing each other. The intermediateimages lie outside the intermirror spaces defined by the concavemirrors. Concave mirrors are positioned optically near to pupil surfacescloser to pupil surfaces than to the intermediate images of theprojection objectives.

International Patent application WO 2004/107011 A1 disclosescatadioptric projection objectives having one common straight opticalaxis and two or more intermediate images and suitable for immersionlithography with numerical apertures up to NA=1.2. At least one concavemirror is positioned optically near to a pupil surface closer to thatpupil surface than to an intermediate images of the projectionobjective.

In the article “Nikon Projection Lens Update” by T. Matsuyama, T.Ishiyama and Y. Ohmura, presented by B. W. Smith in: OpticalMicrolithography XVII, Proc. of SPIE 5377.65 (2004) a design example ofa catadioptric projection lens is shown, which is a combination of aconventional dioptric DUV system and a 6-mirror EUV catoptric systeminserted between lens groups of the DUV system. A first intermediateimage is formed behind the third mirror of the catoptric (purelyreflective) group upstream of a convex mirror. The second intermediateimage is formed by a purely reflective (catoptric) second objectivepart. The third objective part is purely refractive featuring negativerefractive power at a waist of minimum beam diameter within the thirdobjective part for Petzval sum correction.

Japanese patent application JP 2003114387 A and international patentapplication WO 01/55767 A disclose catadioptric projection objectiveshaving one common straight optical axis, a first catadioptric objectivepart for forming an intermediate image and a second catadioptricobjective part for imaging the intermediate image onto the image planeof this system. Concave and convex mirrors are used in combination.

The article “Camera view finder using tilted concave mirror erectingelements” by D. DeJager, SPIE. Vol. 237 (1980) p. 292-298 disclosescamera view finders comprising two concave mirrors as elements of a 1:1telescopic erecting relay system. The system is designed to image anobject at infinity into a real image, which is erect and can be viewedthrough an eyepiece. Separate optical axes of refractive system partsupstream and downstream of the catoptric relay system are paralleloffset to each other. In order to build a system having concave mirrorsfacing each other mirrors must be tilted. The authors conclude thatphysically realizable systems of this type have poor image quality.

International patent applications WO 92/05462 and WO 94/06047 and thearticle “Innovative Wide-Field Binocular Design” in OSA/SPIE Proceedings(1994) pages 389ff disclose catadioptric optical systems especially forbinoculars and other viewing instruments designed as inline systemhaving a single, unfolded optical axis. Some embodiments have a firstconcave mirror having an object side mirror surface arranged on one sideof the optical axis and a second concave mirror having a mirror surfacefacing the first mirror and arranged on the opposite side of the opticalaxis such that the surface curvatures of the concave mirrors define andintermirror space. A front refractive group forms a first intermediateimage near the first mirror and a second intermediate image is formedoutside of the space formed by the two facing mirrors. A narrow fieldbeing larger in a horizontal direction than in a vertical direction isarranged offset to the optical axis. The object side refractive grouphas a collimated input and the image side refractive group has acollimated output and entrance and exit pupils far from telecentric areformed. The pupil shape is semi-circular unlike pupil surfaces inlithographic projection lenses, which have to be circular and centeredon the optical axis.

The PCT application WO 01/044682 A1 discloses catadioptric UV imagingsystems for wafer inspection having one concave mirror designed asMangin mirror.

Catadioptric projection objectives consisting of a catadioptric imagingsubsystem having one single concave mirror and arranged between an entryside and an exit side refractive imaging subsystem (so-calles R-C-Rsystems) are disclosed, for example, in U.S. application with Ser. No.60/573,533 filed on May 17, 2004 by the applicant. Other examples ofR-C-R-systems are shown in US 2003/0011755, WO 03/036361 or US2003/0197946.

US patent application with title “Catadioptric Projection Objective”filed by the applicant on Jan. 14, 2005 (based on U.S. provisionalapplications 60/536,248 filed on Jan. 14, 2004; U.S., 60/587,504 filedJul. 14, 2004; 60/617,674 filed Oct. 13, 2004; 60/591,775 filed Jul. 27,2004; and 60/612,823 filed Sep. 24, 2004) discloses catadioptricprojection objectives having very high NA and suitable for immersionlithography at NA>1 with maximum values NA=1.2. The projectionobjectives comprise: a first objective part for imaging the patternprovided in the object plane into a first intermediate image, a secondobjective part for imaging the first intermediate imaging into a secondintermediate image, and a third objective part for imaging the secondintermediate imaging directly onto the image plane. The second objectivepart includes a first concave mirror having a first continuous mirrorsurface and a second concave mirror having a second continuous mirrorsurface, the concave mirror faces facing each other and defining anintermirror space. All concave mirrors are positioned optically remotefrom pupil surfaces. The system has potential for very high numericalapertures at moderate lens mass consumption. The full disclosure of thisdocument and the priority documents thereof is incorporated into thepresent application by reference.

SUMMARY OF THE INVENTION

It is one object of the invention to provide a catadioptric projectionobjective suitable for use in the vacuum ultraviolet (VUV) range havingpotential for very high image side numerical aperture which may beextended to values allowing immersion lithography at numerical aperturesNA>1. It is another object to provide catadioptric projection objectivesthat can be build with relatively small amounts of optical material. Itis yet another object to provide compact high-aperture catadioptricprojection objectives having moderate size.

As a solution to these and other objects the invention, according to oneformulation, provides a catadioptric projection objective for imaging apattern provided in an object surface of the projection objective ontoan image surface of the projection objective comprising:

a first, refractive objective part for imaging the pattern provided inthe object plane into a first intermediate image;a second objective part including at least one concave mirror forimaging the first intermediate imaging into a second intermediate image;a third, refractive objective part for imaging the second intermediateimaging onto the image plane; wherein:the projection objective has a maximum lens diameter D_(max), a maximumimage field height Y′, and an image side numerical aperture NA; wherein

COMP1=D _(max)/(Y′·NA ²)

and wherein the following condition holds:

COMP1<10

Generally, the dimensions of projection objectives tend to increasedramatically as the image side numerical aperture NA is increased.Empirically it has been found that the maximum lens diameter D_(max)tends to increase stronger than linear with increase of NA according toD_(max)˜NA^(k), where k>1. A value k=2 is an approximation used for thepurpose of this application. Further, it has been found that the maximumlens diameter D_(max) increases in proportion to the image field size(represented by the image field height Y′). A linear dependency isassumed for the purpose of the application. Based on theseconsiderations a first compactness parameter COMP1 is defined as:

COMP1=D _(max)/(Y′·NA ²).

It is evident that, for given values of image field height and numericalaperture, the first compaction parameter COMP1 should be as small aspossible if a compact design is desired.

Considering the overall material consumption necessary for providing aprojection objective, the absolute number of lenses, N_(L) is alsorelevant. Typically, systems with a smaller number of lenses arepreferred to systems with larger numbers of lenses. Therefore, a secondcompactness parameter COMP2 is defined as follows:

COMP2=COMP1·N _(L).

Again, small values for COMP2 are indicative of compact optical systems.

Further, projection objectives according to the invention have at leastthree objective parts for imaging an entry side field plane into anoptically conjugate exit side field plane, where the imaging objectiveparts are concatenated at intermediate images. Typically, the number oflenses and the overall material necessary to build a projectionobjective will increase the higher the number N_(OP) of imagingobjective parts of the optical system is. It is desirable to keep theaverage number of lenses per objective part, N_(L)/N_(OP), as small aspossible. Therefore, a third compactness parameter COMP3 is defined asfollows:

COMP3=COMP1·N _(L) /N _(OP).

Again, projection objectives with low optical material consumption willbe characterized by small values of COMP3.

A value COMP1<10 indicates a very compact design. Even values ofCOMP1<9.6 are obtained in some embodiments. In some embodiments the lowcompactness is obtained although the numerical aperture is larger than1.2 (i.e. NA>1.2). Embodiments with NA=1.3 or NA=1.35 are possible andallow ultra-high resolution immersion lithography.

In some embodiments, low values for the second compactness parameter canbe obtained. In some embodiments COMP2<260 and/or COMP2<240 is obtained.Embodiments with COMP2<220 are possible.

Alternatively, or in addition, low values for the third compactnessparameter COMP3 are possible. In some embodiments COMP3<80, and lowervalues of COMP3<70 are also possible.

In preferred embodiments, a first concave mirror having a firstcontinuous mirror surface and at least one second concave mirror havinga second continuous mirror surface are arranged in the second objectivepart; pupil surfaces are formed between the object plane and the firstintermediate image, between the first and the second intermediate imageand between the second intermediate image and the image plane; and allconcave mirrors are arranged optically remote from a pupil surface.

In these embodiments a circular pupil centered around the optical axisis be provided in a centered optical system. Two or more concave mirrorsin the system parts contributing to forming the second intermediateimage are provided, where the used area of the concave mirrors deviatessignificantly from an axial symmetric illumination. In preferredembodiments exactly two concave mirrors are provided and are sufficientfor obtaining excellent imaging quality and very high numericalaperture. Systems having one common unfolded (straight) optical axis canbe provided which facilitate manufacturing, adjustment and integrationinto photolithographic exposure systems. No planar folding mirrors arenecessary. However, one or more planar folding mirrors could be utilizedto obtain more compact designs.

All concave mirrors are arranged “optically remote” from pupil surfaceswhich means that they are arranged outside an optical vicinity of apupil surface. They may be arranged optically nearer to field surfacesthan to pupil surfaces. Preferred positions optically remote from apupil surface (i.e. outside an optical vicinity of a pupil surface) maybe characterized by the ray height ratio H=h_(C)/h_(M)>1, where h_(C) isthe height of a chief ray and h_(M) is the height of a marginal ray ofthe imaging process. The marginal ray height h_(M) is the height of amarginal ray running from an inner field point (closest to the opticalaxis) to the edge of an aperture stop, whereas the chief ray heighth_(C) is the height of a chief ray running from an outermost field point(farthest away from the optical axis) parallel to or at small angle withrespect to the optical axis and intersecting the optical axis at a pupilsurface position where an aperture stop may be positioned. With otherwords: all concave mirrors are in positions where the chief ray heightexceeds the marginal ray height.

A position “optically remote” from a pupil surface is a position wherethe cross sectional shape of the light beam deviates significantly fromthe circular shape found in a pupil surface or in an immediate vicinitythereto. The term “light beam” as used here describes the bundle of allrays running from the object surface to the image surface. Mirrorpositions optically remote from a pupil surface may be defined aspositions where the beam diameters of the light beam in mutuallyperpendicular directions orthogonal to the propagation direction of thelight beam deviate by more than 50% or 100% from each other. In otherwords, illuminated areas on the concave mirrors may have a shape havinga form strongly deviating from a circle and similar to a high aspectratio rectangle corresponding to a preferred field shape in lithographicprojection objectives for wafer scanners. Therefore, small concavemirrors having a compact rectangular or near rectangular shapesignificantly smaller in one direction than in the other may be used. Ahigh aperture light beam can therefore be guided through the systemwithout vignetting at mirror edges.

Throughout the specification, the term “objective part” designates animaging subsystem of the projection objective capable of imaging anobject in an object surface of that subsystem into an image surface ofthe subsystem optically conjugated to the object surface of thesubsystem. The object imaged by a subsystem (or objective part) may bethe object in the object surface of the projection objective, or andintermediate image.

Wherever the terms “upstream” or “downstream” are used in thisspecification these terms refer to relative positions along the opticalpath of a light beam running from the object plane to the image plane ofthe projection objective. Therefore, a position upstream of the secondintermediate image is a position optically between the object plane andthe second intermediate image.

The term “intermediate image” generally refers to a “paraxialintermediate image” formed by a perfect optical system and located in asurface optically conjugated to the object surface. Therefore, whereverreference is made to a location or position of an intermediate image,the axial location of this surface optically conjugated to the objectsurface is meant.

According to another aspect of the invention, a catadioptric projectionobjective for imaging a pattern provided in an object surface of theprojection objective onto an image surface of the projection objectivecomprises:

a first, refractive objective part for imaging the pattern provided inthe object surface into a first intermediate image;a second objective part for imaging the first intermediate image into asecond intermediate image;a third, refractive objective part for imaging the second intermediateimage onto the image surface;wherein a first concave mirror having a first continuous mirror surfaceand at least one second concave mirror having a second continuous mirrorsurface are arranged upstream of the second intermediate image; pupilsurfaces are formed between the object plane and the first intermediateimage, between the first and the second intermediate image and betweenthe second intermediate image and the image plane; all concave mirrorsare arranged optically remote from a pupil surface; the first objectivepart has a first number N1 _(AS) of aspheric lenses; the third objectivepart has a second number N3 _(AS) of aspheric lenses; an aspheric lensratio ASR=N1 _(AS)/N3 _(AS) is smaller than 1; and an image sidenumerical aperture NA is larger than 1.2.

Although it would be desired from a manufacturing point of view to havelenses with spherical lens surfaces only, it appears that a certainnumber of aspheric lenses are required to obtain sufficient correctionof image aberrations. It has been found that in designs where the thirdobjective part has more aspheric lenses than the first objective parthave potential for obtaining a good correction status without increasingthe overall number, N_(AS), of aspheric lenses in the projectionobjective above a critical limit where the manufacturing of asphericlenses becomes a critical issue due to the high number of asphericlenses to be manufactured.

In some embodiments the first objective part has spherical lenses onlysuch that N1 _(AS)=0. All-spherical refractive objective parts areparticularly easy to manufacture. An all-spherical first objective partmay be combined with a third objective part having one or more asphericlenses, for example 1 or 2 or 3 or 4 or 5 lenses. Preferablay thecondition 1≦N3 _(AS)≦7 is fulfilled.

Preferably, the first objective part has no more than 4 aspheric lenses,i.e. N1 _(AS)≦4.

It has been found that the first objective part can be built in manycases with a small number of lenses, thereby optimizing lens materialconsumption and a compact size of the first objective part particularlyin axial direction. In some embodiments, the first objective partincludes no more than 5 lenses such that the number N1 _(L) of lenses inthe first objective part fulfills the condition N1 _(L)≦5. Embodimentswith N1 _(L)=4 are possible. It appears, however, that N1 _(L)=5 may bepreferable in many cases.

In some embodiments, the first objective part has positive lenses only,whereby formation of the first intermediate image can be obtained withsmall maximum lens diameters in the first objective part. In otherembodiments, at least one negative lens may be useful, particularly forimproving correction within the first objective part. Exactly onenegative lens is often preferred for that purpose. The negative lens mayhave a concave lens surface on the image side and may be placed betweenthe pupil surface of the first objective part and the first intermediateimage.

It is known that aspheric surfaces provided on optical elements, such aslenses, mirrors and/or essentially planar faces of plates, prisms or thelike can be utilized to improve both the correction status and theoverall size and material consumption of optical systems. In someembodiments, the projection objective includes at least one “doubleasphere” comprising a first aspheric surface and a second asphericsurface immediately adjacent to the first aspheric surface, therebyallowing a transmitted beam to pass two subsequent aspheric surfaceswithout passing an intermediate spheric or planar surface. Doubleaspheres have proven to be a very powerful correction means in someembodiments.

A double asphere may take the structure of a biaspherical lens having anaspheric entrance surface and an aspheric exit surface. In somepreferred embodiments the double asphere is formed by facing adjacentaspheric surfaces of two subsequent lenses. Thereby, an “air space”bounded by aspheric surfaces on both the entry and exit side can beobtained. The “air space” can be filled with air of another gas havingrefractive index n≈1. Where aspheric surfaces of a double asphere aredistributed on facing lens surfaces of subsequent lenses, the asphericsurfaces can be positioned very close together if desired. An opticaldistance, measured along the optical axis, between the first and secondaspheric surface of the double asphere may therefore be smaller than thethickness (measured along the optical axis) of the thinner one ofconsecutive lenses forming the double asphere. A complex radialdistribution of refractive power can thereby be obtained at a definedposition in an axially narrow region along the optical axis.

In some embodiments, the third objective part includes at least onedouble asphere. Preferably, that double asphere is positioned opticallybetween the second intermediate image and the pupil surface of the thirdobjective part, thereby preferably influencing the ray angles in aregion of generally diverging beams. A second double asphere may beprovided in that objective part.

Alternatively, or in combination, the first objective part may includeat least one double asphere. Where a double asphere is provided withinthe first objective part, it has been found beneficial when the doubleasphere in the first objective part is positioned optically close to orat a pupil surface of the first objective part.

As pointed out earlier, avoiding large numbers of aspheric surfaces onlenses may contribute to facilitating manufacturing of the projectionobjective. Under certain conditions, the correcting action of a singleaspheric surface can be approximated by one or more spherical surfaceswhere large angles of incidence of rays occur on that surface. In someembodiments, the first objective part includes at least one lens havinga lens surface where incidence angles of rays transiting that lenssurface include incidence angles larger than 60°. Preferably, thatsurface may be optically close to the pupil surface The angle ofincidence (incidence angle) in this case is defined as the angleenclosed by a ray and the surface normal of the lens surface at thepoint of impingement of that ray on the lens surface. High incidenceangle surfaces of that kind may be employed to reduce the number ofaspheres.

The previous and other properties can be seen not only in the claims butalso in the description and the drawings, wherein individualcharacteristics may be used either alone or in sub-combinations as anembodiment of the invention and in other areas and may individuallyrepresent advantageous and patentable embodiments.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a longitudinally sectioned view of a first embodiment of aprojection objective according to the invention;

FIG. 2 is a longitudinally sectioned view of a second embodiment of aprojection objective according to the invention;

FIG. 3 is a longitudinally sectioned view of a third embodiment of aprojection objective according to the invention;

FIG. 4 is a longitudinally sectioned view of a fourth embodiment of aprojection objective according to the invention;

FIG. 5 is a longitudinally sectioned view of a fifth embodiment of aprojection objective according to the invention;

FIG. 6 is a longitudinally sectioned view of a sixth embodiment of aprojection objective according to the invention;

FIG. 7 is a longitudinally sectioned view of a seventh embodiment of aprojection objective according to the invention;

FIG. 8 is a longitudinally sectioned view of a eighth embodiment of aprojection objective according to the invention;

FIG. 9 is a longitudinally sectioned view of a ninth embodiment of aprojection objective according to the invention;

FIG. 10 is a longitudinally sectioned view of a tenth embodiment of aprojection objective according to the invention;

FIG. 11 is a longitudinally sectioned view of a eleventh embodiment of aprojection objective according to the invention;

FIG. 12 is a longitudinally sectioned view of a twelfth embodiment of aprojection objective according to the invention;

FIG. 13 is a longitudinally sectioned view of a thirteenth embodiment ofa projection objective according to the invention;

FIG. 14 is a longitudinally sectioned view of a fourteenth embodiment ofa projection objective according to the invention;

FIG. 15 is a longitudinally sectioned view of a fifteenth embodiment ofa projection objective according to the invention;

FIG. 16 is a longitudinally sectioned view of a sixteenth embodiment ofa projection objective according to the invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

In the following description of preferred embodiments of the invention,the term “optical axis” shall refer to a straight line or sequence ofstraight-line segments passing through the centers of curvature of theoptical elements involved. The optical axis is folded by folding mirrors(deflecting mirrors) or other reflective surfaces. In the case of thoseexamples presented here, the object involved is either a mask (reticle)bearing the pattern of an integrated circuit or some other pattern, forexample, a grating pattern. In the examples presented here, the image ofthe object is projected onto a wafer serving as a substrate that iscoated with a layer of photoresist, although other types of substrate,such as components of liquid-crystal displays or substrates for opticalgratings, are also feasible.

Where tables are provided to disclose the specification of a designshown in a figure, the table or tables are designated by the samenumbers as the respective figures. Corresponding features in the figuresare designated with like or identical reference identifications tofacilitate understanding. Where lenses are designated, an identificationL3-2 denotes the second lens in the third objective part (when viewed inthe light propagation direction).

FIG. 1 shows a first embodiment of a catadioptric projection lens 100according to the invention designed for ca. 193 nm UV workingwavelength. It is designed to project an image of a pattern on a reticlearranged in the planar object surface OS (object plane) into the planarimage surface IS (image plane) on a reduced scale, for example, 4:1,while creating exactly two real intermediate images IMI1, IMI2. A firstrefractive objective part OP1 is designed for imaging the pattern in theobject surface into the first intermediate image IMI1 at an enlargedscale. A second, catoptric (purely reflective) objective part OP2 imagesthe first intermediate image IMI1 into the second intermediate imageIMI2 at a magnification close to 1:1. A third, refractive objective partOP3 images the second intermediate image IMI2 onto the image surface ISwith a strong reduction ratio. The second objective part OP2 comprises afirst concave mirror CM1 having the concave mirror surface facing theobject side, and a second concave mirror CM2 having the concave mirrorsurface facing the image side. The mirror surfaces are both continuousor unbroken, i.e. they do not have a hole or bore. The mirror surfacesfacing each other define a catadioptric cavity, which is also denotedintermirror space, enclosed by the curved surfaces defined by theconcave mirrors. The intermediate images IMI1, IMI2 are both situatedinside the catadioptric cavity well apart from the mirror surfaces.

Each mirror surface of a concave mirror defines a “curvature surface” or“surface of curvature” which is a mathematical surface extending beyondthe edges of the physical mirror surface and containing the mirrorsurface. The first and second concave mirrors are parts of rotationallysymmetric curvature surfaces having a common axis of rotationalsymmetry.

The objective 100 is rotational symmetric and has one straight opticalaxis AX common to all refractive and reflective optical components.There are no folding mirrors. The concave mirrors have small diametersallowing to bring them close together and rather close to theintermediate images lying in between. The concave mirrors are bothconstructed and illuminated as off-axis sections of axial symmetricsurfaces. The light beam passes by the edges of the concave mirrorsfacing the optical axis without vignetting.

The projection objective 100 is designed as an immersion objective forλ=193 nm having an image side numerical aperture NA=1.2 when used inconjunction with the high index immersion fluid, e.g. pure water,between the exit surface of the objective closest to the image surfaceIS, and the image surface IS. The refractive first objective part OP1has spherical lenses only. Both concave mirrors CM1, CM2 are asphericalmirrors. The third objective part OP3 has one aspheric surface (entrancesurface of lens L3-9) near the position of the pupil surface P3 of thatobjective part (where the chief ray CR of the imaging intersects theoptical axis AX) and a second aspheric surface on the exit side of thepenultimate lens L3-12 immediately upstream of the last, image sideplano-convex lens L3-13. The last lens, which will be in contact with animmersion fluid during operation of the projection objective, is alsodenoted “immersion lens” in this specification. Although the projectionobjective is not fully corrected for all aberrations, it shows that animaging is possible with a small number of aspheric lenses (N_(AS)=2)all placed in the third objective part.

FIG. 2 shows a second embodiment of a projection objective 200 having anall-spheric first objective part OP1 and only one aspheric lens L3-4 inthird objective part OP3. An aperture stop AS is placed in the thirdobjective part in the region of the pupil surface PS3 thereof. There isno need for a well-corrected position for an aperture stop in the firstobjective part OP1, which, in this case, consists of only four lenses,all lenses being spherical positive lenses. Thereby, a very simple andcompact construction of the first objective part is obtained.

The projection objective 200 is designed as an immersion lens for λ=193nm having an image side numerical aperture NA=1.20 when used inconjunction with a high index immersion fluid, e.g. pure water, betweenthe exit surface of the objective and the image surface. Thespecification for this design is summarized in Table 2. The leftmostcolumn lists the number of the refractive, reflective, or otherwisedesignated surface, the second column lists the radius, r, of thatsurface [mm], the third column lists the distance, d [mm], between thatsurface and the next surface, a parameter that is referred to as the“thickness” of the optical element, the fourth column lists the materialemployed for fabricating that optical element, and the fifth columnlists the refractive index of the material employed for its fabrication.The sixth column lists the optically utilizable, clear, semi diameter[mm] of the optical component. A radius r=0 in a table designates aplanar surface (having infinite radius).

In the case of this particular embodiment, three surfaces (surfaces 9,10, 18) are aspherical surfaces. Table 2A lists the associated data forthose aspherical surfaces, from which the sagitta or rising height p(h)of their surface figures as a function of the height h may be computedemploying the following equation:

p(h)=[((1/r)h ²)/(1+SQRT(1−(1+K)(1/r)² h ²))]+C1·h ⁴ +C2·h ⁶+ . . . ,

where the reciprocal value (1/r) of the radius is the curvature of thesurface in question at the surface vertex and h is the distance of apoint thereon from the optical axis. The sagitta or rising height p(h)thus represents the distance of that point from the vertex of thesurface in question, measured along the z-direction, i.e., along theoptical axis. The constants K, C1, C2, etc., are listed in Table 2A.

It is remarkable that in this embodiment many aberrations are correctedto a high degree with a small number of lenses (N_(L)=13) and only oneaspheric lens (L3-4) in addition to the aspheric concave mirrors CM1,CM2. Particularly, all third-order and fifth-order aberrations are zero.The variation in telecentricity is corrected over the field.Higher-order (seventh-order and higher) distortion is corrected over thefield. Pupil aberration on the image side is corrected so that the imageside numerical aperture NA=1.2 is constant over the field. Two real raysare corrected on-axis and four aperture rays are corrected at anintermediate field point. Higher-order (seventh-order and higher)astigmatism is corrected at the edge of the field and at an intermediatefield point. This correction status is obtained with an objective wherethe lens diameters of the third objective part (acting as a focusinglens group) are quite small, with 218 mm diameter for the largest lens.The first lens L3-1 of the third objective part has a relatively largegeometrical distance to the vertex of the geometrically nearest mirror(first concave mirror CM1), where that axial mirror-lens-distance MLD is90 mm. This is about 7.5% of the axial distance between object surfaceOS and image surface IS, this object-image distance also being denotedas “track length”. A large geometrical distance MLD between the imageside first concave mirror CM1 and the first lens of the third objectivepart contributes to small lens diameters in the third objective part.

The last lens L3-9 on the image side (immersion lens) has a short radius(50 mm) of the spherical entrance surface, whereby small incidenceangles are obtained at that surface.

The design can be optimized with regard to residual aberrations, wherehigher order Petzval curvature and higher order sagitta obliquespherical aberration appears to dominate. Adding one lens to the firstobjective part and/or providing one or more further aspheric surfacescan contribute to reduce the residual aberrations. An example of afurther development of the design of FIG. 2 is shown in FIG. 3, where anadditional negative lens L1-4 designed as a meniscus lens having animage side concave surface is added in the first objective part betweenthe pupil surface P1 thereof and the first intermediate image. Thismodification allows to correct the mentioned residual aberrations. Thisexample exemplifies, amongst others, that the basic design allows highflexibility for correcting imaging errors within overall simpleconstruction with small number of lenses and a small number ofaspherical lenses.

A fourth embodiment of a projection objective 400 is shown in FIG. 4,the specification thereof is given in tables 4 and 4A. Similar to theembodiments of FIGS. 2 and 3, there is only one aspheric lens, namelypositive meniscus lens L3-4 having an aspheric exit surface, in thatsystem, placed in the third objective part OP3 in the region of largestbeam diameter upstream of the aperture stop AS optically close to thepupil surface P3 of that objective part. The first objective part OP1 isall-spherical, having only one negative lens L1-4 in a sequenceP-P-P-N-P, where “P” denotes a positive lens and “N” denotes a negativelens. From a construction point of view, a large axial distance betweenthe vertex of the image side concave mirror CM1 and the first lens L3-1of the third objective part OP3 is apparent, this distance MLD beingmore than 10% of the track length.

FIG. 5 shows a variant of the systems of FIGS. 3 and 4, where slightmodifications predominantly in the first objective part OP1 were appliedto a improve correction. The resulting design of FIG. 5 has two fieldpoints that are corrected for both astigmatism and Petzval curvature,and the field zone with no astigmatism is in focus.

In preferred designs of the invention, distortion, astigmatism, Petzvalcurvature and telecentricity variation over the field can all becorrected to very high orders with a similar construction of the firstobjective part OP1 (serving as a relay system to form the firstintermediate image IMI1) and only a few spherical lenses in addition tothe aspheric mirrors.

It appears that two aspheric concave mirrors CM1, CM2 are important forobtaining good correction with a small number of aspheric lenses. Twoaspheric mirrors generally allow to make a design that is corrected fortwo chief ray aberrations, like distortion and telecentricity variation,to very high orders. It appears that those two aberrations can beexactly corrected by the two aspheric mirrors if the asphericdeformations of that mirrors are set correctly. It is one remarkableaspect, that, in addition, the astigmatism and Petzval curvature canalso be corrected to a high degree with an all-spherical first objectivepart OP1.

It appears that there are at least three characteristics, which, singlyor in combination, can contribute to the positive properties of thedesign type with regard to aberration corrections. One aspect is thatthe concave mirrors may preferably be quite unequal in radius, comparedto other embodiments where the concave mirrors CM1, CM2 are identical oralmost identical. Further, it appears that quite a lot of coma at theintermediate images IMI1 and/or IMI2 facilitates correction with a smallnumber of aspheric lenses. Also, the remarkably large air space(mirror-lens-distance MLD) between the vertex of the image side concavemirror CM1 and the first lens of the third objective part appears tocontribute to that beneficial properties.

It appears that the object side and the image side and/or the projectionobjective, i.e. the first objective part OP1 and the third objectivepart OP3, can almost be designed independently. In particular, the thirdobjective part (focusing lens group) can be designed for apertureaberrations without much concern for field aberrations, and then a firstobjective part being relatively simple in construction can be designedto compensate for field aberration, wherein that compensation might beobtained without aspheric lenses or with only a small number of asphericlens, e.g. only one aspheric lens.

The previous embodiments show that designs are available having a fairlysimple first objective part with only four or five lenses, where alllenses may be spherical. Such rather simple relay lens group can givecorrection for field aberrations to an extremely high order. Apertureaberrations are preferably corrected in the third objective part, whichmay also have a fairly simple construction with just a few aspherics,the number of aspheric lenses in third objective part preferably beinghigher than the number of aspheric lenses in the first objective part.

FIGS. 6 and 7 show closely related embodiments 600, 700, where thenumber of aspheric lenses in the refractive first and third objectivepart is increased when compared to the previous embodiments. Thespecification of objective 700 is given in tables 7 and 7A. Animprovement with respect to aperture aberrations is obtained.Particularly, seven aspheric lenses are used, where N1 _(AS)=2 and N3_(AS)=5, such that the aspheric lens ratio ASR=0.4. The design of FIG. 6having two aspheric lenses L1-2 and L1-5 in the first objective part OP1has an wavefront aberration of 5 milliwaves over the field.

One double asphere DA is provided in the third objective part OP3optically between a second intermediate image 1M12 and the pupil surfaceP3 of that objective part in a region of significantly increasing beamdiameter. The double asphere is formed by the aspheric exit surface ofpositive lens L3-6 and the subsequent aspheric entry surface of thefollowing positive meniscus lens L3-7 immediately adjacent thereto. Theaxial separation of the two aspheric surfaces is smaller than thethickness of the thinner lens L3-7 adjacent to the double asphere suchthat the aspheres are in close proximity. A complex radial distributionof refractive power is thereby obtained in a specific region of thebeam, thereby contributing strongly to image correction.

FIGS. 8 and 9 show embodiments 800, 900 very similar in design. Thespecification of projection objective 900 is given in tables 9, 9A. Animage-side numerical aperture NA=1.2 and wavefront error of about 6milliwaves is obtained with only six aspheric lenses, where one asphericlens (positive meniscus L1-5 having image side concave surface placednear the pupil surface P1) is provided in the first objective part andthe remainder of five aspheric lenses are distributed within the thirdobjective part OP3. These aspheric lenses include a biconcave negativemeniscus L3-2, a double asphere DA formed by a lens pair L3-5, L3-6 withfacing aspheric surfaces, a biconvex positive lens L3-9 close to theaperture stop AS, and a positive lens L3-10 between the aperture stopand the image surface IS. As indicated by the ray distribution in FIG.8, the front pupil in the relay section formed by first objective partOP1 is pretty well corrected. A focus region with little or no comaaberrations (low-coma intermediate image) for both intermediate imagesIMI1 and IMI2 is apparent. The low-coma intermediate image IMI2 isrefocused onto the image surface with refractive objective part OP3having a thick positive lens L3-1 on the entry side and a significantwaist W (i.e. a region of beam diameter constriction) between the firstlens L3-1 and the region of largest beam diameter shortly upstream ofthe aperture stop AS. Double asphere DA is placed in the divergent beambetween the waist and the aperture stop AS.

The projection objective 1000 in FIG. 10 may in some respects beconsidered a s a variant of the embodiments shown in FIGS. 8 and 9. Aspecification thereof is given in tables 10, 10A. Whereas the thirdobjective part OP3 has five aspheric lenses relatively similar in designand positioning when compared to the embodiments 800 and 900, there isno aspheric lens in the first objective part OP1, such that N_(AS)=5.Remarkably, an all-spherical doublett consisting of an image-sidebiconvex positive lens L1-6 and a negative meniscus lens L1-7 having anobject side concave surface immediately downstream of the positive lensis positioned near the pupil surface P1. High angles of incidence ofrays exiting the positive lens L1-6 and entering the subsequent negativelens L1-7 are found in that region, where the angles of incidenceinclude angles larger than 60°. It appears that the optical effect ofthe aspheric lens L1-5 of embodiments 800, 900 having a difficult tomanufacture aspheric surface with rapid slope changes can at leastpartly be simulated by using some fairly high incidence angles (in therange of 60°-65°) in a similar region near the pupil surface of thefirst objective part OP1. Since the spherical surfaces of the doublettlenses L1-6, L1-7 are easier to manufacture, manufacturability can beimproved in some cases by replacing an aspheric lens by one or morespherical lens surfaces where high incidence angles occur.

When replacement of an aspheric surface by spherical surfaces isconsidered, it appears that what most matters is the base sphericalcurvature. A spherical doublett may therefore be able to replace anaspheric surface—even a very high order aspheric.

The correction status of variants of embodiment 1000 ranges between 4, 5and 6 milliwaves over the field. This indicates that this correction canbe obtained with an all-spherical first objective part OP1 and that thecomplete design does not need many aspheric lenses (only 5 lensaspherics here) to obtain a good performance.

The specification of the catadioptric projection objective 1100 is givenin tables 11, 11A. The embodiment is a good example to show that “doubleaspheres” having two pretty strong aspheric lens surfaces very close toeach other may be a very powerful design component. Here, a doubleasphere DA formed by lenses L3-4 and L3-5 is found in the region ofincreasing beam diameter within the third objective part OP3, similar tothe embodiments shown in FIGS. 8, 9, and 10, for example. In addition, asecond double asphere DA formed by the facing surfaces of lenses L1-5and L1-6 is present optically near the front pupil, i.e. the pupilsurface P1 of the first objective part OP1. In this embodiment,N_(AS)=8, N1 _(AS)=3 and N3 _(AS)=5. The correction is about 2.5milliwaves only at NA=1.2, with the largest lens diameter of 220 mmfound in the third objective part close to the aperture stop AS. Thisexemplifies the potential of this design for obtaining good opticalperformance with a small number of aspheric lenses.

FIG. 12 shows an immersion objective for λ=193 nm having NA=1.3 (insteadof NA=1.2 in the previous examples). The largest lens diameter (foundshortly upstream of the aperture stop AS within the third objective partOP3) is 270 mm. There are just eight aspheric lenses with N1 _(AS)=2 andN3 _(AS)=6. These include one double asphere DA formed by lenses L3-4and L3-5 and positioned in a region of diverging beam between a waist Win the third objective part and the aperture stop AS. The field radiusis 66 mm. The correction is about 4 to 6 milliwaves over the field. Thedesign assumes exactly telecentric input. It is evident that from theray configuration at the intermediate images that there is a largeamount of coma at the intermediate images.

A further embodiment of a catadioptric immersion objective 1300 withNA=1.3 is shown in FIG. 13. The specification is given in tables 13,13A. N_(AS)=10, N1 _(AS)=4 and N3 _(AS)=6. Although the image-sidenumerical aperture NA=1.3 corresponds to that of objective 1200, thelargest lens diameter is only 250 mm (instead of 270 mm in embodiment1200). Still, the wavefront error is about 4 milliwaves over the fieldonly. Again, the design is characterized by the absence of a real stopso that a telecentric input is required. Again a large amount of coma isfound at the intermediate images.

The catadioptric immersion objective 1400 in FIG. 14 (specificationgiven in tables 14 and 14A) is another example of a high NA catadioptricimmersion objective with NA=1.3 and a relatively small maximum lensdiameter, that lens diameter of the largest lens being only 250 mm. Fourout of eleven aspheric lenses are found in the first objective part OP1,the remainder of seven aspheric lenses is distributed in the thirdobjective part OP3. When compared to previous designs, manufacturabilityof the aspheric lenses is improved by observing the requirement that allof the aspheric lens surfaces have less than 1.0 mm deformation from aspheric surface and have local aspheric radii being greater than 150 mmfor each aspheric surface. Three double aspheres are provided. Onedouble asphere DA formed by lenses L1-6 and L1-7 positioned at the pupilsurface P1 within the first objective part OP1 is designed to havefairly high incidence angles which appears to have a similar effect asshort local aspheric radii (which are more difficult to manufacture).There are two double aspheres DA in the third objective part OP3, namelyone double asphere formed by facing surfaces of negative lenses L3-1,L3-2 in the region of minimum lens diameter within the third objectivepart, and a subsequent double aspheric formed by facing surfaces oflenses L3-3 and L3-4 in the region of largest beam diameter increasebetween the second intermediate image IMI2 and the aperture stop AS,which is positioned between the region of largest beam diameter and theimage surface IS. Like the embodiments of FIGS. 11 to 13, large amountof coma is present in the intermediate images IMI1, IMI2.

The catadioptric immersion objective 1500 in FIG. 15 (specification intables 15 and 15A) is a variant of the embodiment shown in FIG. 14,where sizes and types of lenses present in the objective 1500 areessentially the same. A difference lies in the fact that an additionalbiconvex positive lens L3-1 is introduced immediately after the secondintermediate image IMI2, thereby providing positive refractive power onthe entry side of third objective part OP3. Good performance at NA=1.3is obtained.

The basic design has potential for even higher image side numericalapertures with NA>1.3. The catadioptric immersion objective 1600 in FIG.16 (specification in tables 16 and 16A) is based on the design of FIG.15, but optimized to obtain NA=1.35. Like in that embodiment, there areten lenses in the first objective part (including 4 aspheric lenses),and twelve lenses in the third objective part (including 7 asphericlenses). Although the basic types of lenses are the same, lensthickness, surface radii and lens positions differ slightly. As thenumerical aperture increases, it appears beneficial to place theaperture stop AS in the third objective part OP3 between the region ofmaximum beam diameter (at biconvex lens L3-8) and the image surface ISin the region of strongly converging beam. Here, only three positivelenses are placed between the aperture stop and the image surface.

It may be beneficial to place the second objective part OP2geometrically closer to the image surface the higher the desirednumerical aperture is. For convenience, the second objective part OP2,preferably consisting of two aspheric concave mirrors CM1, CM2 only, isalso denoted “mirror group” in the following. In order to demonstratethis feature, a first optical axis length OAL1 is defined between theobject surface OS and the vertex of the concave mirror CM2 geometricallyclosest to the object surface, and a third optical axis length OAL3 isdefined between the vertex of the concave mirror (CM1) geometricallyclosest to the image surface and the image surface (see FIG. 16). Basedon this definition, a mirror group position parameter MG=OAL1/OAL3 isdefined, where this value tends to be larger the further the mirrorgroup tends to be positioned on the image side of the projectionobjective. In table 17, the values of OAL1, OAL3 and MG are summarizedfor all embodiments described here. Based on these data, a mirror groupposition parameter MG>0.7 appears to be desirable in order to obtainhigh image side numerical apertures. Preferably, MG≧0.8. Morepreferably, MG≧0.9.

Each projection objective described here has a high NA image side endwhere projection radiation exits the projection objective at an exitsurface ES, which is preferably planar in order to allow a uniformdistance between the exit surface and a planar substrate surfacearranged at the image surface IS. The lens closest to the image surfaceand forming the exit surface ES, is denoted “last lens” LL here.Preferably, the last lens is a plano-convex positive lens having acurved entry surface ENS, which is spherically curved in mostembodiments, and the planar exit surface ES. In order to obtain high NAit has been found useful to design the last lens such that largerefractive power provided by the curved entry surface ENS is arranged asclose as possible to the image surface. Further, strong curvatures, i.e.small curvature radii of the entry surface ENS of the last lens LLappear desirable. If T_(LL) is the thickness of the last lens on theoptical axis (i.e. the axial distance between the entry surface ENS andthe exit surface ES measured along the optical axis), R_(LL) is theobject side vertex radius of the last lens (i.e. the radius of the entrysurface ENS), and DIA_(LL) is the optically free diameter of the entrysurface of the last lens, then the parameters LL1=T_(LL)/R_(LL) andLL2=DIA_(LL)/R_(LL) should preferably fall within certain limits.Particularly, it has been found useful if the conditions 1.1<LL1<2.2holds for LL1. Preferably, the upper limit may be even smaller, such as1.8 or 1.7 or 1.6. As parameter LL1 becomes unity for a hemisphericallens, where the center of curvature or the entry surface coincides withthe exit surface, the condition regarding LL1 shows thatnon-hemispherical last lenses are preferred, where the center ofcurvature of the curved entry surface lies outside the last lens,particularly beyond the image surface.

Alternatively, or in addition, the condition 2.1<LL2<2.6 shouldpreferably hold for LL2. The upper limit could be smaller, e.g. 2.5 or2.4 or 2.3. The respective values for LL1 and LL2 are presented in table18. If at least one of the above condition holds, strong positive powerprovided by the curved entry surface of the last lens is provided closeto the image surface, thereby allowing a large image side numericalaperture NA to be obtained, particularly with NA>1.1 or NA>1.2, such asNA=1.3 or NA=1.35.

With regard to the correction status of the intermediate images IMI1,IMI2 it is found that in some embodiments both intermediate images areessentially focused (i.e. many aberrations are corrected to a highdegree), whereas in other embodiments significant aberrations occur,particularly coma (compare FIG. 11-16) A significant coma aberration forthe second intermediate image IMI2 may be beneficial with respect tooverall correction of the objective. Since the catoptric secondobjective part consisting of the concave mirrors CM1 and CM2 iseffective to image the first intermediate image into the secondintermediate image in an essentially symmetric manner, only little comais usually introduced by the catoptric second objective part. Therefore,the correction status with respect to coma for both intermediate imagestends to be similar. For some embodiments, a significant amount of comaat least for the second intermediate image appears to contributesignificantly to the overall correction. The following observations arenotable in that respect.

The correction of the sine condition of the entire objective ischallenging particularly for objectives having very high image side NA.The correction of sine condition may be facilitated by coma in theintermediate image. If the imaging from the high NA image surface to thelow NA object surface (i.e. in reverse direction when compared to theintended use of projection objectives in lithography) is considered, thethird objective part (where radiation enters) provides an intermediateimage having a certain correction status. Assuming that the sphericalaberration of that imaging is corrected, then the intermediate imagewill be essentially free of coma, if the sine condition of that imagingwould be corrected. In contrast, if the sine condition is not corrected,that intermediate image would have a significant amount of coma. If theintermediate image has a considerable amount of coma, correction of thesine condition in the third objective part is facilitated.

Now, imaging of the second intermediate image into the image surface inthe intended direction (towards the high NA end) is considered. If thesecond intermediate image would have a good correction status,particularly without coma, then the entire correction of the sinecondition would have to be effected by the third objective part imagingthe second intermediate image onto the image surface. If, in contrast, acertain amount of coma is present in the second intermediate image, thenthe third objective part can be designed in a more relaxed manner sincethe correction of the sine condition can at least partly be effected bythe objective parts optically upstream of the third objective part, i.e.the refractive relay system OP1 forming the first intermediate image,and the catoptric second objective part OP2. Therefore, it appears thatdesigns where the correction of coma is distributed between the firstrefractive objective part OP1 and the third objective part OP3 may bebeneficial when compared to objectives where each of that refractiveobjective part is independently corrected for coma.

As mentioned earlier, the invention allows to build high NA projectionobjectives suitable for immersion lithography at NA>1 with compact size.

Table 19 summarizes the values necessary to calculate the compactnessparameters COMP1, COMP2, COMP3 and the respective values for theseparameters for each of the systems presented with a specification table(the table number (corresponding to the same number of a figure) isgiven in column 1 of table 19). Further, the respective values for N1_(AS), N3 _(AS), and ASR are shown.

Table 19 shows that preferred embodiments according to the inventiongenerally observe at least one of the conditions given earlierindicating that compact designs with moderate material consumption areobtained according to the design rules laid out in this specification.Further, the particular values characterizing the aspheric lens numberand distribution are shown.

In the following, further characteristic features of projectionobjectives according to the invention are summarized, where one or moreof those features may be present in an embodiment of the invention.Parameters summarized in tables 20 and 21 are used to demonstrate thesefeatures.

In some embodiments, the chief ray of the imaging process takes acharacteristic course. For demonstration purposes, a chief ray CRrunning from an outermost field point (furthest away from the opticalaxis AX) essentially parallel to the optical axis and intersecting theoptical axis at three consecutive pupil surface positions P1, P2, P3,each within on of the imaging objective parts OP1, OP2, OP3, is drawn inbold line in FIG. 16 to facilitate understanding. The angle includedbetween the optical axis AX and the chief ray CR at each position alongthe chief ray is denoted “chief ray angle” CRA in the following. Thechief ray CR is divergent (chief ray height increasing in lightpropagation direction) at the position of the first intermediate imageIMI1 and converging at the position of the second intermediate imageIMI2. Strongly converging chief rays appear to be beneficial to obtainhigh image side NA and a sufficient correction.

In the region between the two concave mirrors CM1, CM2, the chief raycrosses the optical axis at a high chief ray angle CRA (M), that anglepreferably falling in the region between 58° and 75°, particularlybetween 60° and 72°. (see table 20).

With regard to the magnification provided by the imaging objective partsOP1, OP2, OP3 it appears that it is beneficial if the magnification β₃of the third objective part OP3 imaging the second intermediate imageIMI2 at high reduction ratio onto the image surface should preferablyfall within a range 0.11≦β₃≦0.17. In order to obtain a desired overallreduction ratio (e.g. 1:4 or 1:5) the second objective part OP2 maycontribute to the overall reduction by having a magnification ratioβ₂<1. Preferably, the mirror group forming the second objective part OP2may be designed to have a moderate reducing effect characterized by0.85≦β₂<1. If the second objective part contributes to some extent tothe overall reduction, the third objective part responsible for themajor part of reduction can be designed in a more relaxed manner.

It appears that the refractive power (characterized by the focal lengthf) provided by the first two or three lenses on the entry side of thethird objective part OP3 immediately after the second concave mirror CM2may contribute to good performance by designing this entry group suchthat the overall refractive power of that entry group is negative. Inthe embodiments of FIGS. 2, 4, 14, 15, 16, the entry group is formed bythe first two lenses of the third objective part, providing an entrygroup focal length f3 (L1 . . . 2). In the embodiments of FIGS. 7, 9,10, 11, 12, 13, the entry group is formed by three consecutive lenses,thereby providing a focal length f3 (L1 . . . 3) of the entry group.Values are given in table 20.

On the other hand, it appears that not many negative lenses should bepresent in the third objective part following the second concave mirrorCM2, where that number N3 _(NL) of negative lenses is three or less thanthree in all embodiments (parameter K7 a=YES in table 21), and issmaller than three in the embodiments of FIGS. 2, 4, 14, 15, 16(parameter K7=YES in table 21).

Further, it appears to be beneficial if the optically free diameterDIA₃₁ of the first lens L3-1 of the third objective part OP3 issignificantly smaller than the diameter DIA_(AS) of the aperture stop.Preferably, the diameter ratio DR=DIA₃₁/DIA_(AS) should be smaller than0.9. More preferably, an upper value of 0.8, even more preferably anupper value of 0.7 should not be exceeded. Values for the diameter ratioDR are given in table 21.

Further, it has been found that it may be beneficial if more than 50% ofall lenses after the second concave mirror (i.e. lenses of the thirdobjective part) have an optically free diameter smaller than thediameter of the second intermediate image IMI2 following the secondconcave mirror CM2. This condition is fulfilled for all embodiments, asshown by parameter K10 in table 21.

Also, all lenses of the first, refractive objective part OP1 shouldpreferably be smaller than the paraxial size of the first intermediateimage. If this condition is fulfilled, parameter K9 in table 20 isfulfilled.

In order to provide strong positive refractive power for obtainingstrong beam convergence at the high NA image end it is preferable if atleast one of 8 and 9 consecutive lenses upstream of the image surfaceshould have positive refractive power. This is exemplified by parameterK11 in table 21, which is “YES”=Y if the condition is fulfilled and“NO”=N if the condition is not fulfilled.

In this context it is worth to note that it appears beneficial forobtaining high NA, if the position of the aperture stop AS is in theregion of convergent beam between the position of largest beam diameterwithin the third objective part OP3, and the image surface. Thisproperty is exemplified by the ratio AS-IS/TT shown in table 20, whereAS-IS is the geometrical distance between the position of the aperturestop AS and the image surface IS, and TT is the “track length” of theobjective, i.e. the geometrical distance between object surface andimage surface. The ratio AS-IS/TT may fall in a range between 0.09 and0.18 (see table 20).

This feature is particularly pronounced in embodiments of FIGS. 12 to16.

Further characteristic features are evident from the course of the comabeam. Here, a “coma beam” refers to a beam emerging from an object fieldpoint furthest remote from the optical axis and transiting the aperturestop at the edge of the aperture. The coma beam therefore contributes todetermining which lens diameters must be used. The angle included bythis coma beam and the optical axis is denoted in “coma beam angle CBA”in the following. The angle of that beam after refraction at the lastlens of the first objective part (upstream of the first intermediateimage IMI1) is denoted CBA1, whereas the angle of the coma beamimmediately upstream of the refraction at the first lens of the imageside third objective part OP3 is denoted CBA3. The values of theseangles are given in table 21. It appears that for both coma beam anglesvalues of less than 5° may be beneficial (table 21).

As noted above, the chief ray intersects the optical axis at pupilsurfaces P1, P2, P3 in the concatenated objective parts OP1, OP2, OP3.As the pupil surfaces within the first and third objective parts areaccessible for setting an aperture stop, these positions are alsodenoted aperture positions. The beam diameter at the aperture stop,DIA_(AS) and the beam diameter DIA_(P1) at the pupil surface P1 in thefirst objective part, conjugated to the position of the aperture stop,should fall within certain limits. The ratio DIA_(AS)/DIA_(P1) should belarger than 1. Preferably the condition DIA_(AS)/DIA_(P1)>2 should besatisfied. (see table 21).

It is to be understood that all systems described above may be completesystems for forming a real image (e.g. on a wafer) from a real object.However, the systems may be used as partial systems of larger systems.For example, the “object” for a system mentioned above may be an imageformed by an imaging system (relay system) upstream of the object plane.Likewise, the image formed by a system mentioned above may be used asthe object for a system (relay system) downstream of the image plane.

The above description of the preferred embodiments has been given by wayof example. From the disclosure given, those skilled in the art will notonly understand the present invention and its attendant advantages, butwill also find apparent various changes and modifications to thestructures and methods disclosed. It is sought, therefore, to cover allchanges and modifications as fall within the spirit and scope of theinvention, as defined by the appended claims, and equivalents thereof.

The contents of all the claims is made part of this description byreference.

TABLE 2 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35.375532 661 131.949135 35.970704 SILUV 1.56038308 87.585 2 406.761557 104.8090685.863 3 3059.843345 27.506721 SILUV 1.56038308 75.651 4 −198.5004281.017885 74.735 5 130.040913 27.00543 SIO2V 1.5607857 63.806 6645.092151 131.039998 59.727 7 295.611694 27.141936 SIO2V 1.560785773.901 8 −488.184201 269.934616 75.186 9 −168.378905 −229.757172 REFL146.55 10 191.880744 321.03168 REFL 142.027 11 3866.479073 15 SILUV1.56038308 84.264 12 200.296391 23.187613 81.401 13 −853.282183 12 SILUV1.56038308 81.615 14 183.221555 40.757592 85.452 15 −260.12103340.375633 SILUV 1.56038308 88.116 16 −119.830244 1.000373 93.697 17377.105699 25.88629 SILUV 1.56038308 107.44 18 806.870168 6.60952108.283 19 402.481304 53.968509 SILUV 1.56038308 109.043 20 −239.94209830.458674 110.617 21 0 0 105.938 22 448.147113 83.062268 SILUV1.56038308 104.924 23 −279.740357 1 97.993 24 225.5812 54.802627 SILUV1.56038308 86.607 25 −998.977091 1 76.79 26 66.501558 33.495315 SILUV1.56038308 57.153 27 131.610919 0.100001 48.532 28 49.614771 31.476238SILUV 1.56038308 37.98 29 0 3 H2OV193 1.43667693 21.144 30 0 0 16.918

TABLE 2A Aspheric constants SRF 9 10 18 K −0.452326 −0.261902 0 C10.00E+00 0.00E+00 9.85E−08 C2 7.69E−14 −1.44E−15 6.78E−13 C3 −1.99E−182.07E−19 −8.47E−17 C4 4.90E−22 −1.14E−23 −2.33E−21 C5 −2.26E−26−5.61E−28 −3.90E−27 C6 5.71E−31 4.00E−32 0.00E+00

TABLE 4 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35.793949 661 120.118526 42.934369 SIO2V 1.5607857 90.022 2 412.405523 126.64572987.381 3 633.242338 22.659816 SIO2V 1.5607857 61.491 4 −210.08658146.042292 60.076 5 130.137899 30.712802 SIO2V 1.5607857 61.678 6−522.603119 34.752273 61.093 7 −1187.517919 12 SIO2V 1.5607857 59.563 8114.106019 28.350504 59.307 9 222.108344 30.902208 SIO2V 1.560785768.301 10 −299.15163 256.466683 69.608 11 −150.205889 −216.466684 REFL144.702 12 198.80711 372.659505 REFL 143.838 13 281.738211 19.28133SIO2V 1.5607857 93.203 14 125.854932 30.787413 85.622 15 774.983336 12SIO2V 1.5607857 86.014 16 190.931672 31.687547 88.47 17 −741.76714242.517621 SIO2V 1.5607857 90.935 18 −141.29554 16.921402 95.293 19161.709504 50.734927 SIO2V 1.5607857 110.341 20 256.329089 15.962417100.811 21 231.628153 52.349429 SIO2V 1.5607857 101.677 22 −355.16215724.394096 100.975 23 0 0 90.786 24 298.995001 34.357885 SIO2V 1.560785787.38 25 −413.984465 1 84.467 26 175.550604 30.458976 SIO2V 1.560785775.285 27 577.927994 1 68.756 28 62.317914 30.663962 SIO2V 1.560785753.826 29 131.702852 0.1 46.784 30 50 29.329548 SIO2V 1.5607857 36.87731 0 3 H2OV193 1.43667693 21.061 32 0 0 17.019

TABLE 4A Aspheric constants SRF 11 12 20 K −0.536388 −0.289717 0 C10.00E+00 0.00E+00 1.38E−07 C2 1.40E−13 1.67E−15 1.67E−12 C3 −1.27E−177.77E−21 −1.05E−16 C4 1.60E−21 1.74E−23 6.80E−21 C5 −8.54E−26 −1.14E−27−2.06E−24 C6 2.08E−30 3.15E−32 1.25E−28

TABLE 7 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35.099987LUFTV193 1.00030168 66 1 127.537708 53.812686 SIO2V 1.5607857 88.311 2−1424.403792 3.183483 85.654 3 −759.069196 12 SIO2V 1.5607857 85.361 4433.221851 0.999992 N2VP950 1.00029966 81.029 5 138.239142 29.708609SIO2V 1.5607857 81.573 6 417.683183 28.068546 N2VP950 1.00029966 79.1537 178.55362 36.417688 SIO2V 1.5607857 70.512 8 −494.07005 2.060781N2VP950 1.00029966 65.044 9 155.188372 24.032084 SIO2V 1.5607857 54.38110 599.310224 35.766015 N2VP950 1.00029966 44.737 11 −222.23251915.518078 SIO2V 1.5607857 43.157 12 −158.540648 83.688942 N2VP9501.00029966 48.398 13 −340.58772 31.059836 SIO2V 1.5607857 87.94 14−151.34275 0.999997 N2VP950 1.00029966 92.472 15 −3390.668582 33.959537SIO2V 1.5607857 99.743 16 −231.522766 249.6227 N2VP950 1.00029966101.635 17 −184.547095 −209.6227 REFL 1.00029966 139.73 18 167.029818249.92793 REFL 1.00029966 120.262 19 621.261771 25.224239 SIO2V1.5607857 88.34 20 −556.892379 11.423072 N2VP950 1.00029966 87.849 21928.352541 31.861443 SIO2V 1.5607857 84.353 22 −3894.042096 4.258076N2VP950 1.00029966 81.388 23 −515.240387 10.001518 SIO2V 1.560785780.081 24 128.35306 19.188164 N2VP950 1.00029966 74.104 25 308.87011410.000043 SIO2V 1.5607857 74.899 26 137.165863 21.160324 N2VP9501.00029966 75.171 27 535.690303 10.000083 SIO2V 1.5607857 77.414 28270.832047 16.021774 N2VP950 1.00029966 81.505 29 6886.310806 36.167214SIO2V 1.5607857 84.419 30 −205.759199 3.943304 N2VP950 1.00029966 92.0931 −673.879021 20.931667 SIO2V 1.5607857 96.507 32 −289.392079 17.53001N2VP950 1.00029966 102.53 33 −578.552137 45.351534 SIO2V 1.5607857114.339 34 −180.862466 0.999999 N2VP950 1.00029966 118.861 35 486.68332967.153511 SIO2V 1.5607857 127.052 36 −560.582675 −0.510173 N2VP9501.00029966 126.509 37 0 8.553303 N2VP950 1.00029966 124.301 38804.757635 41.461871 SIO2V 1.5607857 124.183 39 −290.647705 1.000095N2VP950 1.00029966 124.308 40 251.571322 46.634322 SIO2V 1.5607857109.472 41 −989.86448 1.000042 N2VP950 1.00029966 103.95 42 86.54607840.283002 SIO2V 1.5607857 72.678 43 219.985874 0.999974 N2VP9501.00029966 63.421 44 87.427095 40.057397 SIO2V 1.5607857 50.39 45 0 3H2OV193 1.43667693 21.125 46 0 0 16.5

TABLE 7A Aspheric constants SRF 4 10 17 18 22 K 0 0 −0.746204 −0.2869240 C1 6.03E−08 4.24E−07 0.00E+00 0.00E+00 −1.62E−07 C2 7.60E−12 −3.19E−113.46E−14 6.73E−15 5.78E−12 C3 −2.87E−17 1.88E−14 −2.87E−19 −1.19E−182.80E−16 C4 −1.68E−21 −2.25E−18 1.04E−22 2.14E−22 2.70E−22 C5 1.40E−241.47E−21 −7.95E−27 −2.28E−26 −1.87E−24 C6 2.15E−30 4.27E−25 3.94E−311.46E−30 1.45E−28 C7 −1.03E−32 −5.55E−28 −1.07E−35 −5.11E−35 −5.39E−33C8 1.22E−36 1.42E−31 1.22E−40 7.66E−40 1.42E−36 SRF 30 31 38 41 K 0 0 00 C1 5.31E−08 −5.32E−08 −3.90E−08 −2.16E−08 C2 1.81E−12 −1.14E−134.45E−15 2.47E−12 C3 1.20E−16 8.83E−17 4.67E−17 −8.51E−17 C4 −4.21E−21−8.32E−21 −1.21E−21 3.85E−21 C5 −3.09E−25 3.44E−25 3.05E−27 −1.62E−25 C6−6.36E−31 −3.35E−29 9.87E−32 5.85E−30 C7 −1.97E−33 1.94E−33 3.24E−38−6.78E−35 C8 −7.59E−38 −2.07E−37 7.29E−42 −7.43E−40

TABLE 9 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35 LUFTV1931.00030168 66 1 167.582589 42.122596 SIO2V 1.5607857 84.14 2 −417.6311567.351797 83.778 3 −242.658436 14.999993 SIO2V 1.5607857 83.61 4−639.381532 1 N2VP950 1.00029966 84.261 5 118.161915 52.272937 SIO2V1.5607857 82.935 6 −405.15896 2.506345 N2VP950 1.00029966 79.384 7−349.632507 57.987649 SIO2V 1.5607857 78.093 8 −625.61536 0.999978N2VP950 1.00029966 57.316 9 258.6518 13.775087 SIO2V 1.5607857 51.65 103309.642007 6.085525 N2VP950 1.00029966 46.297 11 2505.032734 45.485164SIO2V 1.5607857 44.366 12 −160.280782 83.214895 N2VP950 1.0002996643.224 13 −179.709766 28.095749 SIO2V 1.5607857 75.748 14 −113.0942680.99999 N2VP950 1.00029966 80.728 15 −828.761389 28.910199 SIO2V1.5607857 86.836 16 −193.020806 237.594315 N2VP950 1.00029966 88.806 17−170.301754 −197.594315 REFL 1.00029966 137.191 18 164.75935 237.900412REFL 1.00029966 114.069 19 213.979631 41.964013 SIO2V 1.5607857 95.39420 −571.726494 30.907497 N2VP950 1.00029966 93.468 21 −607.90575612.000001 SIO2V 1.5607857 81.046 22 213.467641 20.540794 N2VP9501.00029966 75.725 23 118232.9153 10.073155 SIO2V 1.5607857 75.17 24134.456642 11.393332 N2VP950 1.00029966 73.687 25 193.022977 12.19948SIO2V 1.5607857 75.339 26 149.820622 39.058556 N2VP950 1.00029966 76.13227 −473.179277 16.280318 SIO2V 1.5607857 82.022 28 −265.194438 3.071697N2VP950 1.00029966 88.666 29 −596.281929 34.549024 SIO2V 1.560785789.977 30 −234.857742 2.605623 N2VP950 1.00029966 100.123 31 −681.43216846.50367 SIO2V 1.5607857 108.764 32 −170.41214 29.245335 N2VP9501.00029966 113.403 33 709.34663 59.972517 SIO2V 1.5607857 125.713 34−519.598522 1.519132 N2VP950 1.00029966 126.621 35 450.108474 47.183961SIO2V 1.5607857 123.987 36 −298.350498 −21.086597 N2VP950 1.00029966122.98 37 0 23.537621 N2VP950 1.00029966 120.368 38 195.285408 43.215118SIO2V 1.5607857 105.824 39 22862.90022 1.012838 N2VP950 1.00029966100.964 40 97.777305 39.731996 SIO2V 1.5607857 76.541 41 292.589024.247054 N2VP950 1.00029966 67.621 42 77.06685 38.565556 SIO2V 1.560785747.651 43 0 3 H2OV193 1.43667693 21.068 44 0 0 16.5

TABLE 9A Aspheric constants SRF 10 17 18 22 28 K 0 −0.609408 −0.404331 00 C1 4.50E−07 0.00E+00 0.00E+00 −6.14E−08 1.09E−07 C2 −2.70E−11 7.78E−15−9.34E−15 3.42E−12 3.58E−12 C3 4.11E−14 3.36E−19 −6.87E−19 2.90E−165.02E−16 C4 −1.48E−17 −2.72E−23 1.64E−25 −4.54E−21 −3.35E−20 C5 1.25E−202.59E−27 2.75E−27 −1.65E−24 −2.30E−24 C6 −3.96E−24 −1.24E−31 −6.03E−311.25E−27 5.00E−29 C7 4.61E−28 3.13E−36 3.69E−35 −1.97E−31 −3.03E−32 C85.89E−32 −3.19E−41 −8.59E−40 1.57E−35 2.67E−36 SRF 29 35 39 K 0 0 0 C1−2.77E−08 −4.34E−08 −1.96E−08 C2 −7.08E−13 1.12E−13 2.57E−12 C3 5.74E−165.13E−17 −8.29E−17 C4 −4.78E−20 −1.19E−21 5.74E−21 C5 3.19E−24 −1.83E−26−6.59E−25 C6 −2.07E−28 2.98E−31 5.81E−29 C7 6.57E−33 3.65E−35 −2.82E−33C8 −8.15E−37 −9.28E−40 5.86E−38

TABLE 10 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35 LUFTV1931.00030168 66 1 287.201368 23.165416 SIO2V 1.5607857 80.746 29548.563984 5.351787 N2VP950 1.00029966 81.708 3 237.938727 27.034898SIO2V 1.5607857 84.398 4 9748.474128 5.009226 N2VP950 1.00029966 83.75 5162.029839 30.440188 SIO2V 1.5607857 81.611 6 97.700439 24.108143N2VP950 1.00029966 71.632 7 285.67649 59.994975 SIO2V 1.5607857 72.04 8−212.500863 1.413267 N2VP950 1.00029966 73.053 9 231.286954 59.984338SIO2V 1.5607857 68.81 10 −272.808567 19.053716 N2VP950 1.00029966 59.33211 470.335844 27.320605 SIO2V 1.5607857 44.739 12 −139.04097 1.780746N2VP950 1.00029966 45.687 13 −127.442683 14.466354 SIO2V 1.560785745.809 14 −301.722518 29.641205 N2VP950 1.00029966 49.864 15 −87.76458215.000004 SIO2V 1.5607857 53.623 16 −141.229355 34.507463 N2VP9501.00029966 61.571 17 −259.685309 20.689312 SIO2V 1.5607857 75.669 18−163.685953 1.001108 N2VP950 1.00029966 79.628 19 −425.644839 25.473178SIO2V 1.5607857 82.933 20 −177.604049 271.436522 N2VP950 1.0002996685.588 21 −192.411117 −231.436522 REFL 1.00029966 145.837 22 181.316474275.635733 REFL 1.00029966 127.943 23 160.280773 39.766183 SIO2V1.5607857 84.727 24 433.630809 1.168124 N2VP950 1.00029966 79.442 25172.894805 12.000005 SIO2V 1.5607857 76.455 26 142.708343 25.834202N2VP950 1.00029966 72.617 27 −522.138568 12 SIO2V 1.5607857 71.538 2898.617841 39.707255 N2VP950 1.00029966 66.149 29 −242.043593 13.973969SIO2V 1.5607857 67.886 30 −428.430378 1.113943 N2VP950 1.00029966 76.04831 1395.872365 59.770439 SIO2V 1.5607857 77.227 32 −200.881136 0.999953N2VP950 1.00029966 94.132 33 −796.373326 36.651147 SIO2V 1.5607857101.811 34 −231.145256 0.999958 N2VP950 1.00029966 107.115 351394.739591 34.401193 SIO2V 1.5607857 113.699 36 −367.962973 0.999965N2VP950 1.00029966 114.834 37 501.517244 61.420268 SIO2V 1.5607857114.165 38 −252.939454 −26.770128 N2VP950 1.00029966 113.428 39 027.770123 N2VP950 1.00029966 113.395 40 219.357199 45.58316 SIO2V1.5607857 104.413 41 −692.879408 0.999976 N2VP950 1.00029966 100.937 4289.810973 40.252244 SIO2V 1.5607857 73.593 43 252.083859 1.000011N2VP950 1.00029966 64.98 44 72.146642 41.286323 SIO2V 1.5607857 48.58945 0 3 H2OV193 1.43667693 21.154 46 0 0 16.501

TABLE 10A Aspheric constants SRF 21 22 26 30 31 K −0.459313 −0.341948 00 0 C1 0.00E+00 0.00E+00 −8.70E−08 1.71E−07 −5.72E−08 C2 1.02E−14−4.95E−15 −1.61E−12 6.01E−12 −2.30E−13 C3 −5.02E−19 2.15E−19 1.90E−165.80E−17 1.96E−16 C4 7.89E−23 −9.13E−23 −5.76E−20 −5.21E−20 −1.01E−20 C5−5.82E−27 1.06E−26 1.91E−23 −8.66E−24 −1.44E−23 C6 2.63E−31 −7.20E−31−5.62E−27 −1.36E−27 2.35E−27 C7 −6.44E−36 2.52E−35 7.41E−31 6.08E−31−1.26E−31 C8 6.64E−41 −3.58E−40 −4.73E−35 −5.19E−35 −3.01E−36 SRF 37 41K 0 0 C1 −5.65E−08 −2.58E−08 C2 8.17E−14 3.95E−12 C3 8.43E−17 −2.50E−16C4 −7.58E−22 2.34E−20 C5 −6.19E−26 −2.23E−24 C6 −8.89E−31 1.68E−28 C71.00E−34 −7.72E−33 C8 −1.44E−39 1.60E−37

TABLE 11 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000035.000000 66.0 1 213.125261 21.214076 SIO2 1.560786 82.2 2 480.5256651.000000 82.6 3 185.297502 31.993610 SIO2 1.560786 84.8 4 7598.2611134.999310 83.7 5 117.345388 11.527031 SIO2 1.560786 79.0 6 90.28643562.598487 72.4 7 309.861090 34.537793 SIO2 1.560786 74.4 8 −255.1699661.000267 73.6 9 183.493169 25.255034 SIO2 1.560786 67.0 10 −733.60893519.932610 63.6 11 331.584148 52.054611 SIO2 1.560786 51.0 12 −141.3514398.662425 44.3 13 −135.694467 12.000000 SIO2 1.560786 45.2 14 −438.41169916.902875 48.6 15 −80.203122 31.804553 SIO2 1.560786 49.3 16 −123.13097834.208750 62.6 17 −308.561940 19.408823 SIO2 1.560786 76.5 18−190.486221 1.000288 80.0 19 −339.277899 24.240054 SIO2 1.560786 81.9 20−169.353619 266.539075 84.6 21 −190.594737 −226.539075 REFL 149.9 22178.620508 266.539075 REFL 125.1 23 221.347957 30.251017 SIO2 1.56078686.1 24 1463.195317 1.000000 83.7 25 250.202612 40.863033 SIO2 1.56078681.0 26 143.175358 28.105820 69.5 27 −407.324144 12.000273 SIO2 1.56078668.5 28 115.532167 36.897440 67.0 29 −221.836172 11.999999 SIO2 1.56078668.9 30 −226.960357 1.000000 74.6 31 2492.697910 55.157108 SIO2 1.56078678.7 32 −161.739806 1.000000 91.0 33 −695.448789 45.255799 SIO2 1.56078697.4 34 −259.466566 1.000000 104.4 35 1602.782680 56.958100 SIO21.560786 107.7 36 −470.968577 1.000000 110.0 37 0.000000 0.000000 109.338 386.901024 44.983112 SIO2 1.560786 110.7 39 −272.274704 1.000000111.1 40 175.872135 43.089438 SIO2 1.560786 99.5 41 −2548.7634991.000000 95.3 42 91.643707 37.595346 SIO2 1.560786 72.4 43 255.7814581.000000 64.0 44 67.785174 39.963844 SIO2 1.560786 47.1 45 0.0000003.000000 H20 1.436677 21.2 46 0.000000 0.000000 16.5

TABLE 11A Aspheric constants SRF 2 10 11 21 22 K 0 0 0 −0.496553−0.336642 C1 1.643437E−09 8.928205E−09 −8.734171E−08 0.000000E+000.000000E+00 C2 1.208889E−14 1.236176E−11 2.818326E−12 5.747313E−15−6.240079E−15 C3 8.824285E−18 −1.197673E−15 −1.228572E−15 −1.412426E−196.784381E−20 C4 2.922597E−21 6.507491E−19 1.042260E−18 2.261574E−23−7.158782E−23 C5 −2.369521E−25 −1.334779E−22 −3.756091E−23 −1.450149E−278.093083E−27 C6 3.356358E−30 2.670393E−26 −1.473570E−25 5.772350E−32−5.720179E−31 C7 2.828477E−35 −3.381376E−30 7.050051E−29 −1.232729E−362.078917E−35 C8 1.430860E−38 2.797022E−34 −9.591943E−33 1.120210E−41−3.145520E−40 SRF 26 30 31 38 41 K 0 0 0 0 0 C1 −7.826978E−081.171952E−07 −8.372229E−08 −4.940289E−08 −1.537092E−08 C2 1.072045E−125.982055E−12 1.174253E−12 4.933796E−13 3.778447E−12 C3 4.523977E−16−1.760506E−16 −2.681026E−16 6.928288E−17 −2.017127E−16 C4 −1.271459E−19−1.993128E−20 −1.550679E−20 −1.609487E−21 1.881073E−20 C5 3.954232E−23−9.529811E−24 −1.593859E−24 −7.739698E−26 −2.087789E−24 C6 −1.083373E−261.085578E−28 −3.657276E−30 2.774226E−30 1.840295E−28 C7 1.465752E−302.273221E−31 2.631779E−32 −1.572253E−36 −9.812256E−33 C8 −8.520650E−35−2.669719E−35 −7.142431E−36 −4.163468E−40 2.332003E−37

TABLE 12 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35 66 1251.921115 26.62683 SILUV 1.56038308 83.147 2 −989.210896 1 83.812 3226.732024 32.025623 SILUV 1.56038308 85.26 4 1085.208221 1 83.38 5128.283517 22.646566 SILUV 1.56038308 80.387 6 88.961725 15.54597370.501 7 125.835208 59.877475 SILUV 1.56038308 70.846 8 −376.328333 165.691 9 291.512418 41.049599 SILUV 1.56038308 60.714 10 −247.1072936.176611 50.627 11 152.969724 21.192151 SILUV 1.56038308 42.473 12228.518434 5.482582 43.945 13 1248.660787 43.964726 SILUV 1.5603830844.944 14 −152.706184 12.818026 54.237 15 −87.366215 15.60332 SILUV1.56038308 54.983 16 −85.682846 3.636916 59.545 17 −86.526213 23.242695SILUV 1.56038308 60.097 18 −108.668356 1 69.405 19 −200 16.671044 SILUV1.56038308 72.006 20 −142.798216 250.765038 74.782 21 −166.718612−210.765038 REFL 144.311 22 174.284123 264.180115 REFL 134.956 23285.315103 27.076989 SILUV 1.56038308 95.88 24 1483.882926 52.74040294.405 25 185.601922 11.999964 SILUV 1.56038308 84.907 26 111.08786922.323131 81.119 27 1952.941696 12 SILUV 1.56038308 80.86 28 111.20634258.54433 74.709 29 −126.687949 9.999452 SILUV 1.56038308 76.019 30−155.19187 1 85.365 31 1585.242523 54.769473 SILUV 1.56038308 95.306 32−154.387429 1 104.707 33 −348.074244 55.068746 SILUV 1.56038308 113.51134 −243.634705 1 127.583 35 −1336.659415 41.515446 SILUV 1.56038308135.024 36 −276.658598 1 137.317 37 435.341885 31.595504 SILUV1.56038308 136.928 38 −3129.657481 1.00012 136.305 39 2105.97553544.442342 SILUV 1.56038308 135.677 40 −300.54242 −13.727335 134.991 41 014.727335 128.371 42 267.42491 43.877196 SILUV 1.56038308 118.91 437074.847026 1 115.781 44 96.288803 41.059596 SILUV 1.56038308 80.776 45228.69124 1 72.473 46 61.190052 42.233094 SILUV 1.56038308 49.33 47 0 3WATER 1.437 23.01 48 0 0 16.502

TABLE 12A Aspheric constants SRF 10 19 21 22 26 K 0 0 −0.418696−0.381372 0 C1 3.04E−07 −2.32E−08 0.00E+00 0.00E+00 −1.87E−07 C24.29E−11 2.52E−13 6.76E−15 −3.96E−15 −1.36E−11 C3 −1.17E−14 −8.41E−187.47E−20 1.19E−19 −1.96E−16 C4 4.44E−18 −1.26E−20 −4.44E−24 −6.18E−23−5.50E−21 C5 −1.37E−21 4.90E−25 8.79E−28 5.39E−27 4.78E−24 C6 2.64E−25−2.31E−28 −4.77E−32 −3.03E−31 −9.08E−28 C7 −4.76E−29 2.58E−32 1.37E−369.32E−36 7.93E−32 C8 2.93E−33 −2.18E−36 −1.19E−41 −1.19E−40 −5.07E−36SRF 30 31 37 40 43 K 0 0 0 0 0 C1 1.24E−07 −6.86E−08 −4.46E−08 −2.05E−09−8.05E−08 C2 9.26E−12 −4.81E−14 −5.47E−13 1.28E−13 5.05E−12 C3 4.76E−167.52E−17 5.21E−17 1.78E−17 −2.49E−16 C4 1.38E−20 −1.74E−20 6.91E−22−6.14E−22 1.14E−20 C5 −7.47E−24 8.52E−25 −2.40E−26 4.48E−26 −3.40E−25 C65.98E−28 −2.23E−29 −2.11E−31 −1.55E−30 2.27E−30 C7 −7.73E−32 −3.06E−33−2.39E−35 1.88E−35 2.38E−34 C8 7.38E−36 1.25E−37 5.01E−40 −4.01E−40−5.88E−39

TABLE 13 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35 65 1186.586828 23.414502 SIO2V 1.5607857 83.982 2 597.259215 10.26813 84.1063 246.448938 35.48684 SIO2V 1.5607857 87.131 4 −495.470793 0.99999986.762 5 174.29392 12 SIO2V 1.5607857 82.318 6 105.886625 42.97492575.746 7 298.014263 30.569503 SIO2V 1.5607857 77.754 8 −362.4901740.999996 77.303 9 197.585289 26.9647 SIO2V 1.5607857 72.92 10 115.1913766.433657 64.383 11 87.197031 33.092701 SIO2V 1.5607857 63.668 12−21177.81881 11.342683 59.87 13 170.163316 22.577563 SIO2V 1.560785753.888 14 −397.634502 6.245625 50.153 15 −329.557796 25.65494 SIO2V1.5607857 46.008 16 −440.379282 27.044628 48.461 17 −57.443645 14.999995SIO2V 1.5607857 48.693 18 −75.393191 18.813359 56.902 19 −65.42711514.999993 SIO2V 1.5607857 58.809 20 −85.530419 0.099998 69.648 21−227.629071 32.632252 SIO2V 1.5607857 78.348 22 −113.134147 273.11657782.743 23 −185.855248 −233.116577 REFL 152.166 24 187.338489 273.423654REFL 143.116 25 277.370431 23.120389 SIO2V 1.5607857 85.671 261042.417218 0.999997 83.965 27 232.607011 22.047511 SIO2V 1.560785781.953 28 681.476699 7.231337 79.179 29 −4285.293249 15 SIO2V 1.560785778.599 30 110.856061 30.36008 72.288 31 −2955.113107 12 SIO2V 1.560785771.211 32 119.488431 40.054646 69.309 33 −194.926507 10 SIO2V 1.560785771.047 34 −199.009301 0.999987 77.318 35 7009.414576 51.207677 SIO2V1.5607857 80.754 36 −165.020018 1 95.379 37 −367.692901 34.170188 SIO2V1.5607857 103.911 38 −197.86104 1 110.595 39 −660.167042 61.861902 SIO2V1.5607857 118.204 40 −205.342177 1 126.012 41 465.895739 25.776885 SIO2V1.5607857 126.361 42 −2628.836635 0.099011 125.541 43 8527.26083340.948445 SIO2V 1.5607857 125.078 44 −271.386413 0 124.177 45 0 0112.927 46 243.774903 41.095341 SIO2V 1.5607857 107.874 47 −3313.9401951 104.66 48 83.350349 42.069771 SIO2V 1.5607857 73.803 49 208.118275 166.123 50 55.435689 36.911372 SIO2V 1.5607857 44.754 51 0 3 H2OV1931.43667693 22.888 52 0 0 16.254

TABLE 13A Aspheric constants SRF SRF 2 12 13 21 23 K 0 0 0 0 −0.4498 C15.14E−08 2.47E−07 6.72E−08 −1.49E−08 0.00E+00 C2 −3.80E−14 3.12E−112.44E−11 5.94E−13 −6.07E−16 C3 −1.94E−18 −4.32E−15 1.29E−15 −3.47E−17−1.49E−19 C4 4.21E−21 1.90E−18 3.61E−19 −4.54E−22 7.27E−24 C5 −7.98E−25−1.98E−22 5.61E−22 −1.73E−25 −4.02E−28 C6 6.31E−29 2.16E−26 −4.89E−263.64E−29 9.03E−33 C7 −2.12E−34 −3.06E−31 1.03E−30 −2.29E−33 −7.65E−38 C8−1.42E−37 4.40E−34 5.75E−34 1.51E−37 −5.25E−43 SRF 24 30 34 35 41 K−0.304978 0 0 0 0 C1 0.00E+00 −2.20E−07 1.50E−07 −9.41E−08 −6.08E−08 C2−4.92E−15 −1.47E−11 1.13E−11 −6.32E−13 −6.68E−14 C3 4.31E−20 −6.27E−175.33E−16 −4.10E−17 9.32E−17 C4 −3.35E−23 −7.88E−20 5.07E−21 −1.21E−201.98E−21 C5 2.63E−27 3.08E−23 −4.57E−24 −2.81E−24 −8.05E−26 C6 −1.39E−31−5.95E−27 −2.28E−28 8.14E−29 9.24E−32 C7 3.83E−36 6.01E−31 −1.86E−325.30E−33 −1.69E−34 C8 −4.49E−41 −2.86E−35 1.72E−35 −2.48E−36 6.17E−39SRF 44 47 K 0 0 C1 −7.09E−09 −6.42E−08 C2 4.04E−13 4.46E−12 C3 2.36E−17−2.33E−16 C4 5.85E−22 1.60E−20 C5 −5.55E−26 −7.22E−25 C6 6.24E−301.37E−29 C7 −3.15E−34 3.59E−34 C8 5.34E−39 −9.82E−39

TABLE 14 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35 65 1264.155216 53.039363 SIO2V 1.5607857 81.542 2 −708.29109 15.80469 84.6563 198.655375 49.267177 SIO2V 1.5607857 90.333 4 −296.847851 1.03262989.02 5 188395.3333 12.000019 SIO2V 1.5607857 83.702 6 102.54553614.972935 73.983 7 142.785896 38.44762 SIO2V 1.5607857 75.139 87336.068136 1 73.713 9 106.928203 12.000081 SIO2V 1.5607857 70.401 1085.093164 1.641753 64.758 11 76.898689 64.469228 SIO2V 1.5607857 64.8412 −453690.3967 0.494708 50.446 13 151.681366 18.484685 SIO2V 1.560785747.423 14 −363.490767 1.138548 43.25 15 −423.037048 10 SIO2V 1.560785743.525 16 513.67606 37.991004 45.761 17 −54.826872 16.135714 SIO2V1.5607857 48.065 18 −76.475326 2.91112 59.373 19 −235.467293 87.250476SIO2V 1.5607857 69.466 20 −123.833603 270.153968 91.586 21 −189.904942−230.153968 REFL 154.818 22 175.052549 279.034717 REFL 138.889 23584.131276 18.62041 SIO2V 1.5607857 71.907 24 111.389792 27.30061268.759 25 −1516.326452 12.000002 SIO2V 1.5607857 69.364 26 147.37860731.451574 73.254 27 −362.020208 12 SIO2V 1.5607857 76.176 28 −208.4998151.640751 80.458 29 2551.550571 58.800655 SIO2V 1.5607857 89.721 30−162.566587 1 102.174 31 −596.110808 30.823878 SIO2V 1.5607857 111.77932 −242.915533 1.000004 115.425 33 −1403.743088 66.546477 SIO2V1.5607857 119.764 34 −315.509469 1.000866 126.177 35 408.00738450.326509 SIO2V 1.5607857 125.404 36 −350.602433 1 123.958 37−1141.174919 18.698745 SIO2V 1.5607857 116.585 38 −446.728577 −3.536343114.214 39 0 4.536343 109.775 40 159.383791 42.840202 SIO2V 1.5607857100.406 41 3177.374501 1 97.192 42 78.804469 35.408881 SIO2V 1.560785768.008 43 170.008236 1 60.471 44 55.898462 33.213214 SIO2V 1.560785742.887 45 0 3 H2OV193 1.43667693 22.783 46 0 0 16.253

TABLE 14A Aspheric constants SRF 2 12 13 19 21 K 0 0 0 0 −0.447479 C13.78E−08 3.57E−07 −5.44E−08 3.83E−08 0.00E+00 C2 2.66E−12 1.96E−11−2.40E−11 2.56E−13 −5.59E−16 C3 −1.97E−16 6.31E−15 8.87E−15 −2.12E−163.43E−19 C4 2.37E−20 −9.55E−19 −7.06E−18 5.73E−21 −3.56E−23 C5 −2.23E−24−2.55E−22 1.67E−21 −1.00E−24 2.72E−27 C6 1.48E−28 −8.65E−26 −2.22E−252.39E−28 −1.16E−31 C7 −9.02E−34 2.04E−29 −1.24E−28 1.26E−32 2.72E−36 C8−2.19E−37 −1.29E−32 8.07E−33 −1.88E−36 −2.60E−41 SRF 22 24 25 28 29 K−0.269196 0 0 0 0 C1 0.00E+00 −1.90E−07 −1.07E−07 7.94E−08 −4.11E−08 C2−2.35E−15 −9.95E−12 1.90E−12 3.38E−12 −9.39E−13 C3 4.59E−21 −5.46E−16−1.31E−16 5.77E−17 −3.94E−17 C4 −1.95E−23 1.36E−20 −8.66E−20 −3.25E−207.40E−21 C5 2.32E−27 1.11E−23 6.80E−23 −2.17E−25 −7.50E−24 C6 −1.42E−31−1.76E−27 −1.45E−26 4.68E−30 1.58E−27 C7 4.52E−36 1.20E−30 3.34E−304.57E−32 −1.55E−31 C8 −5.19E−41 −6.74E−35 −2.43E−34 1.76E−36 6.35E−36SRF 35 38 41 K 0 0 0 C1 −5.52E−08 −1.11E−08 −2.87E−08 C2 2.65E−138.65E−13 2.22E−12 C3 8.42E−17 3.74E−17 −1.63E−16 C4 3.45E−21 3.35E−212.19E−20 C5 −2.31E−25 −4.18E−25 −1.18E−24 C6 2.28E−31 2.67E−29 −2.24E−29C7 2.16E−35 −8.47E−34 5.71E−33 C8 2.04E−39 5.77E−39 −1.82E−37

TABLE 15 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35 65 1220.440206 90.193314 SIO2V 1.5607857 82.632 2 −2258.387326 0.09997886.391 3 191.078269 45.21979 SIO2V 1.5607857 89.197 4 −346.9392775.038291 87.936 5 −862.704276 11.999955 SIO2V 1.5607857 83.714 6106.229194 9.360323 75.459 7 124.368852 37.350319 SIO2V 1.5607857 77.1218 2278.621151 1 75.985 9 130.547812 11.999956 SIO2V 1.5607857 73.073 1097.147988 1.00002 67.707 11 80.762223 48.20009 SIO2V 1.5607857 67.797 12−836.844333 0.735286 62.235 13 146.655061 35.349711 SIO2V 1.560785756.269 14 −325.682663 5.303246 44.684 15 −237.715704 10 SIO2V 1.560785742.717 16 97614.51754 31.113387 44.942 17 −55.878516 25.725119 SIO2V1.5607857 46.52 18 −84.463856 3.412335 61.171 19 −206.813589 73.554079SIO2V 1.5607857 68.435 20 −122.996844 265.817443 87.048 21 −188.846432−225.817443 REFL 158.348 22 170.512895 266.104304 REFL 131.309 23617.040338 25.358997 SIO2V 1.5607857 77.734 24 −340.978557 1 76.849 25−575.873317 11.999961 SIO2V 1.5607857 74.709 26 127.056764 29.48679268.944 27 −919.909026 11.999959 SIO2V 1.5607857 69.382 28 141.24721833.090673 73.039 29 −327.789177 14.007072 SIO2V 1.5607857 76.032 30−187.527488 1.002508 80.888 31 1268.298268 66.023641 SIO2V 1.560785792.44 32 −172.960759 1 106.476 33 −551.894279 31.122194 SIO2V 1.5607857114.794 34 −248.493705 2.656579 118.516 35 −5734.547222 50.472484 SIO2V1.5607857 123.221 36 −350.590281 3.163294 126.143 37 402.35810943.558538 SIO2V 1.5607857 124.07 38 −381.952357 1 122.788 39−1074.912987 18.425846 SIO2V 1.5607857 116.413 40 −432.576165 −8.977508114.127 41 0 9.977508 111.763 42 180.300844 40.797225 SIO2V 1.5607857101.129 43 6426.19364 1 97.236 44 84.482776 36.262612 SIO2V 1.560785770.522 45 215.215262 1 63.323 46 53.879713 33.812201 SIO2V 1.560785742.561 47 0 3 H2OV193 1.43667693 22.774 48 0 0 16.253

TABLE 15A Aspheric constants SRF 2 12 13 19 21 K 0 0 0 0 −0.468594 C12.23E−08 1.88E−07 −1.64E−07 1.00E−08 0.00E+00 C2 4.33E−12 2.77E−11−1.41E−12 −4.07E−13 1.68E−16 C3 −3.03E−16 −4.05E−15 −5.95E−15 −1.03E−162.66E−19 C4 2.79E−20 −2.39E−18 −2.18E−18 2.01E−20 −2.52E−23 C5 −3.36E−241.40E−21 6.20E−22 −6.52E−24 1.91E−27 C6 2.26E−28 −3.87E−25 −4.85E−261.34E−27 −8.03E−32 C7 −2.80E−33 5.49E−29 2.56E−29 −1.27E−31 1.83E−36 C8−1.73E−37 −3.09E−33 −4.08E−33 5.46E−36 −1.72E−41 SRF 22 25 27 30 31 K−0.258782 0 0 0 0 C1 0.00E+00 1.46E−07 −1.45E−07 6.78E−08 −4.22E−08 C2−2.25E−15 −1.14E−11 1.44E−11 5.29E−12 −1.13E−13 C3 4.56E−19 1.33E−151.58E−16 2.99E−17 −2.12E−16 C4 −7.45E−23 −1.50E−19 −1.60E−19 −3.15E−203.70E−20 C5 7.82E−27 7.50E−24 6.20E−23 3.57E−24 −8.27E−24 C6 −4.50E−311.43E−28 −1.02E−26 −7.69E−28 1.28E−27 C7 1.44E−35 −1.30E−31 1.65E−306.47E−32 −1.13E−31 C8 −1.76E−40 1.14E−35 −1.59E−34 −4.37E−37 4.59E−36SRF 37 40 43 K 0 0 0 C1 −5.99E−08 −1.37E−08 −2.10E−08 C2 4.92E−131.20E−12 1.02E−12 C3 8.41E−17 1.32E−17 −2.69E−18 C4 4.25E−21 5.28E−217.37E−21 C5 −2.88E−25 −5.23E−25 −3.90E−25 C6 5.24E−31 2.93E−29 −7.25E−30C7 5.37E−35 −9.06E−34 1.51E−33 C8 1.09E−39 2.79E−39 −1.24E−38

TABLE 16 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0 35 65 1203.096237 51.348217 SIO2V 1.5607857 84.153 2 −1160.222766 0.09978385.288 3 181.493677 43.475858 SIO2V 1.5607857 86.58 4 −341.9255261.005485 84.893 5 −403.858869 11.999746 SIO2V 1.5607857 83.592 6109.657938 15.898981 74.771 7 164.368819 44.721199 SIO2V 1.560785776.185 8 77645.0807 1 75.386 9 95.919438 11.999975 SIO2V 1.560785773.703 10 80.656102 5.826329 67.839 11 79.189771 47.039779 SIO2V1.5607857 68.939 12 −561.553393 0.099927 64.509 13 139.074465 29.669365SIO2V 1.5607857 60.109 14 −351.160951 9.311808 53.957 15 −473.600856 10SIO2V 1.5607857 43.672 16 620.385225 33.601754 45.134 17 −52.78443514.999981 SIO2V 1.5607857 46.152 18 −74.212989 1.001764 56.339 19−209.153453 84.778236 SIO2V 1.5607857 63.352 20 −130.926715 255.55953385.589 21 −187.311637 −215.559533 REFL 162.9 22 158.774035 264.523552REFL 123.289 23 534.325629 42.990891 SIO2V 1.5607857 83.598 24−461.508523 1 82.714 25 −5934.605843 12.000066 SIO2V 1.5607857 80.886 26119.705874 28.744512 76.197 27 1519.32587 12.058263 SIO2V 1.5607857 77.628 141.843628 31.894192 79.343 29 −915.926476 20.162536 SIO2V 1.560785782.206 30 −205.883678 1.152206 86.328 31 10322.23403 66.866508 SIO2V1.5607857 93.09 32 −181.874156 1 109.763 33 −421.7412 53.839358 SIO2V1.5607857 117.145 34 −248.466964 0.999941 128.448 35 −1926.96711632.001083 SIO2V 1.5607857 134.375 36 −368.835919 1.852034 135.911 37354.164031 52.480694 SIO2V 1.5607857 136.137 38 −368.63102 1 135.137 39−828.73625 11.784388 SIO2V 1.5607857 126.567 40 −810.714199 2.572951124.051 41 0 −1.572951 118.262 42 154.167114 46.690534 SIO2V 1.5607857107.326 43 9845.921815 1 104.915 44 90.785618 33.664668 SIO2V 1.560785774.672 45 224.183877 1 69.281 46 52.291327 34.416469 SIO2V 1.560785743.665 47 0 3 H2OV193 1.43667693 24.683 48 0 0 16.256

TABLE 16A Aspheric constants SRF 2 12 13 19 21 K 0 0 0 0 −0.448249 C18.02E−09 2.78E−07 −1.35E−07 3.82E−08 0.00E+00 C2 4.20E−12 3.61E−117.65E−12 4.03E−15 −6.31E−16 C3 −3.80E−16 −3.72E−15 −3.60E−15 −2.87E−163.14E−19 C4 1.06E−20 −7.33E−19 −1.74E−18 −4.72E−20 −2.63E−23 C5 9.90E−255.93E−22 5.77E−22 4.58E−23 1.70E−27 C6 −1.56E−28 −1.48E−25 4.63E−26−1.86E−26 −6.12E−32 C7 1.90E−32 2.05E−29 −1.32E−29 3.54E−30 1.22E−36 C8−9.78E−37 −1.01E−33 −4.75E−35 −2.52E−34 −1.00E−41 SRF 22 25 27 30 31 K−0.301702 0 0 0 0 C1 0.00E+00 1.70E−07 −1.21E−07 4.69E−08 −4.37E−08 C2−1.93E−15 −1.40E−11 1.82E−11 4.01E−12 −6.80E−13 C3 −1.03E−18 1.35E−156.67E−16 −2.83E−17 −2.42E−16 C4 1.15E−22 −2.19E−19 8.15E−20 −6.69E−223.15E−20 C5 −7.31E−27 1.48E−23 3.45E−24 4.14E−24 −5.56E−24 C6 1.26E−31−6.97E−28 3.08E−27 −1.25E−27 3.74E−28 C7 8.96E−36 −7.36E−32 −5.45E−311.44E−31 −9.55E−33 C8 −2.90E−40 1.12E−35 1.66E−35 −6.05E−36 −7.20E−37SRF 37 40 43 K 0 0 0 C1 −5.26E−08 −3.16E−08 7.85E−10 C2 1.78E−131.40E−12 6.39E−13 C3 6.38E−17 −1.09E−17 −1.45E−17 C4 3.79E−21 6.35E−213.10E−21 C5 −1.89E−25 −5.33E−25 3.20E−25 C6 −3.40E−31 2.59E−29 −5.68E−29C7 1.88E−35 −6.08E−34 3.00E−33 C8 1.27E−39 8.73E−40 −3.92E−38

TABLE 17 FIG. λ NA Yobj OAL1/mm OAL3/mm MG 2 193 1.2 66 430.04 548.460.78 4 193 1.2 66 450.79 582.74 0.77 7 193 1.2 66 466.38 574.00 0.81 9193 1.2 66 460.81 591.60 0.78 10 193 1.2 66 500.44 518.13 0.97 11 1931.2 66 489.34 534.12 0.92 12 193 1.3 66 425.56 613.66 0.69 13 193 1.3 65472.62 544.26 0.87 14 193 1.3 65 513.08 498.55 1.03 15 193 1.3 65 521.66502.53 1.04 16 193 1.35 65 492.88 541.56 0.91

TABLE 18 T_(LL)/ FIG. λ NA Yobj R_(LL)/mm mm DIA_(LL)/mm LL1 LL2 2 1931.2 66 49.61 31.48 75.96 0.63 1.53 4 193 1.2 66 50.00 29.33 73.75 0.591.48 7 193 1.2 66 87.43 40.06 100.36 0.46 1.15 9 193 1.2 66 77.07 38.5795.24 0.50 1.24 10 193 1.2 66 72.15 41.29 96.69 0.57 1.34 11 193 1.2 6667.79 39.96 92.98 0.59 1.37 12 193 1.3 66 61.19 42.23 98.47 0.69 1.61 13193 1.3 65 55.44 36.91 89.08 0.67 1.61 14 193 1.3 65 55.90 33.21 85.450.59 1.53 15 193 1.3 65 53.88 33.81 84.84 0.63 1.57 16 193 1.35 65 52.2934.42 87.11 0.66 1.67

TABLE 19 FIG. λ NA Yobj COMP1 COMP2 COMP3 N1AS N2AS ASR 2 193 1.2 669.18 138 46 0 1 0 4 193 1.2 66 9.29 149 50 0 1 0 7 193 1.2 66 10.6 24481 2 5 0.40 9 193 1.2 66 10.6 232 77 1 5 0.20 10 193 1.2 66 9.52 219 730 5 0 11 193 1.2 66 9.34 215 72 3 5 0.60 12 193 1.3 66 9.70 233 78 2 60.33 13 193 1.3 65 9.08 236 79 4 6 0.67 14 193 1.3 65 9.03 208 69 4 70.57 15 193 1.3 65 8.94 214 72 4 7 0.57 16 193 1.35 65 9.11 218 73 4 70.57

TABLE 20 f3(L1 . . . 2)/ f3(L1 . . . 2)/ FIG. β2 β3 mm mm AS-IS/TTCRA(M)/° 2 0.868 0.168 −150.018 0.172 61.23 4 0.942 0.166 −212.248 0.10462.77 7 0.869 0.171 −441.036 0.146 61.08 9 0.969 0.168 −388.381 0.12362.95 10 0.960 0.154 −274.736 0.128 62.27 11 1.009 0.147 −249.046 0.13764.57 12 1.286 0.122 −247.036 0.118 70.75 13 1.190 0.117 −712.866 0.10068.88 14 1.045 0.126 −114.534 0.097 69.2 15 1.044 0.129 −368.766 0.10169.3 16 0.991 0.134 −430.318 0.095 71.21

TABLE 21 FIG. K7 K7a DIA₃₁/DIA_(AS) K9 K10 K11 CBA1/° CBA3/°DIA_(AS)/DIA_(P1) 2 Y Y 0.833 Y Y N 4.62 7.45 2.135 4 Y Y 1.050 Y Y N2.17 7.17 1.448 7 N Y 0.709 Y Y Y 1.08 0.88 3.349 9 N Y 0.792 Y Y Y 1.321.04 2.837 10 N Y 0.746 Y Y N 3.49 1.68 2.539 11 N Y 0.789 Y Y N 3.251.09 2.534 12 N Y 0.746 Y Y Y 7.11 1.42 3.086 13 N Y 0.758 Y Y Y 5.291.62 2.188 14 Y Y 0.667 Y Y Y 4.04 4.75 2.007 15 Y Y 0.695 Y Y Y 5.282.80 2.353 16 Y Y 0.722 Y Y Y 6.60 2.29 1.950

1-24. (canceled)
 25. A catadioptric projection objective for imaging apattern provided in an object plane of the projection objective onto animage plane of the projection objective comprising: a first, refractiveobjective part for imaging the pattern provided in the object plane intoa first intermediate image; a second objective part including at leastone concave mirror for imaging the first intermediate image into asecond intermediate image; a third, refractive objective part forimaging the second intermediate imaging onto the image plane; whereinthe projection objective includes at least one double asphere having afirst aspheric surface and a second aspheric surface immediatelyadjacent to the first aspheric surface, the double asphere being formedby facing adjacent aspheric surfaces of two consecutive lenses. 26.Projection objective according to claim 25, wherein an axial distancebetween the first aspheric surface and the second aspheric surface ofthe double asphere is smaller than an axial thickness of a thinner oftwo consecutive lenses forming the double asphere.
 27. Projectionobjective according to claim 25, wherein the third objective partincludes at least one double asphere.
 28. Projection objective accordingto claim 27, wherein the double asphere is positioned optically betweenthe second intermediate image and the pupil surface of the thirdobjective part.
 29. Projection objective according to claim 25, whereinthe first objective part includes at least one double asphere. 30.Projection objective according to claim 29, wherein the double asphereis positioned optically close to or at a pupil surface of the firstobjective part.
 31. Projection objective according to claim 25, whereinthe first objective part and the third objective part each include atleast one double asphere.
 32. Projection objective according to claim25, wherein a first concave mirror having a first continuous mirrorsurface and at least one second concave mirror having a secondcontinuous mirror surface are arranged in the second objective part;pupil surfaces are formed between the object plane and the firstintermediate image, between the first and the second intermediate imagesand between the second intermediate image and the image plane; and allconcave mirrors are arranged optically remote from a pupil surface.33-36. (canceled)
 37. A catadioptric projection objective for imaging apattern provided in an object plane of the projection objective onto animage plane of the projection objective comprising: a first, refractiveobjective part for imaging the pattern provided in the object plane intoa first intermediate image; a second objective part including at leastone concave mirror for imaging the first intermediate image into asecond intermediate image; a third, refractive objective part forimaging the second intermediate image onto the image plane; wherein anaperture stop is positioned in the third objective part between a regionof maximum beam diameter and the image surface in a region of aconverging beam.
 38. Projection objective according to claim 37, whereinonly three positive lenses are placed between the aperture stop and theimage surface.
 39. Projection objective according to claim 37, wherein afirst concave mirror having a first continuous mirror surface and atleast one second concave mirror having a second continuous mirrorsurface are arranged in the second objective part; pupil surfaces areformed between the object plane and the first intermediate image,between the first and the second intermediate images and between thesecond intermediate image and the image plane; and all concave mirrorsare arranged optically remote from a pupil surface.
 40. A catadioptricprojection objective for imaging a pattern provided in an object planeof the projection objective onto an image plane of the projectionobjective comprising: a first, refractive objective part for imaging thepattern provided in the object plane into a first intermediate image; asecond objective part including at least one concave mirror for imagingthe first intermediate image into a second intermediate image; a third,refractive objective part for imaging the second intermediate image ontothe image plane; wherein the projection objective has a last lensclosest to the image surface, the last lens being a plano-convexpositive lens having a curved entry surface and a planar exit surface,where T_(LL) is the axial distance between the entry surface and theexit surface measured along an optical axis, R_(LL), is the curvatureradius of the entry surface, and DIA_(LL) is the optically free diameterof the entry surface of the last lens; where LL1=T_(LL)/R_(LL) andLL2=DIA_(LL)/R_(LL) and wherein at least one of the following conditionsholds:1.1<LL1<2.2  (1)2.1<LL2<2.6.  (2)
 41. Projection objective according to claim 40,wherein an image side numerical aperture NA is larger than 1.2. 42.Projection objective according to claim 40, wherein a first concavemirror having a first continuous mirror surface and at least one secondconcave mirror having a second continuous mirror surface are arranged inthe second objective part; pupil surfaces are formed between the objectplane and the first intermediate image, between the first and the secondintermediate images and between the second intermediate image and theimage plane; and all concave mirrors are arranged optically remote froma pupil surface.
 43. A catadioptric projection objective for imaging apattern provided in an object surface of the projection objective ontoan image surface of the projection objective comprising: a first,refractive objective part for imaging the pattern provided in the objectsurface into a first intermediate image; a second objective part forimaging the first intermediate image into a second intermediate image; athird, refractive objective part for imaging, the second intermediateimage onto the image surface; wherein the second objective part includesa first concave mirror having a first continuous mirror surface and asecond concave mirror having a second continuous mirror surface; pupilsurfaces are formed between the object plane and the first intermediateimage, between the first and the second intermediate images and betweenthe second intermediate image and the image plane; all concave mirrorsare arranged optically remote from a pupil surface; wherein a firstoptical axis length OAL1 is defined between the object surface and avertex of a concave mirror geometrically closest to the object surface,and a third optical axis length OAL3 is defined between a vertex of aconcave mirror geometrically closest to the image surface and the imagesurface; and wherein the condition MG>0.7 holds for a mirror groupposition parameter MG=OAL1/OAL3.
 44. Projection objective according toclaim 43, wherein MG>0.8.
 45. A catadioptric projection objective forimaging a pattern provided in an object plane of the projectionobjective onto an image plane of the projection objective comprising: afirst, refractive objective part for imaging the pattern provided in theobject plane into a first intermediate image; a second objective partincluding at least one concave mirror for imaging the first intermediateimage into a second intermediate image; a third, refractive objectivepart for imaging the second intermediate imaging onto the image plane;wherein at least one of 8 and 9 consecutive lenses upstream of the imagesurface have positive refractive power.
 46. Projection objectiveaccording to claim 45, wherein an image side numerical aperture NA islarger than 1.2.
 47. Projection objective according to claim 45, whereina first concave mirror having a first continuous mirror surface and atleast one second concave mirror having a second continuous mirrorsurface are arranged in the second objective part; pupil surfaces areformed between the object plane and the first intermediate image,between the first and the second intermediate images and between thesecond intermediate image and the image plane; and all concave mirrorsare arranged optically remote from a pupil surface. 48-49. (canceled)50. A catadioptric projection objective for imaging a pattern providedin an object plane of the projection objective onto an image plane ofthe projection objective comprising: a first, refractive objective partfor imaging the pattern provided in the object plane into a firstintermediate image; a second objective part including at least oneconcave mirror for imaging the first intermediate image into a secondintermediate image; a third, refractive objective part for imaging thesecond intermediate image onto the image plane; wherein the projectionobjective has a last lens closest to the image surface, the last lensbeing a plano-convex positive lens having a curved entry surface and aplanar exit surface, where T_(LL) is the axial distance between theentry surface and the exit surface measured along an optical axis,R_(LL), is the curvature radius of the entry surface, and DIA_(LL) isthe optically free diameter of the entry surface of the last lens; whereLL1=T_(LL)/R_(LL) and LL2=DIA_(LL)/R_(LL) and wherein at least one ofthe following conditions holds:0.46≦LL1≦0.69  (1)1.15≦LL2≦1.67.  (2)